導電平板之定頻掃描方法研究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：95

、訪客IP：3.149.234.141

姓名

吳昇翰(Sheng-Han Wu) 查詢紙本館藏

畢業系所

光機電工程研究所

論文名稱

導電平板之定頻掃描方法研究
(The Research of Scanning on a Conducting Plate using Constant Frequency)

相關論文

★ 馬達動態特性測試平台	★ 微電鍍成長速度最佳化與影像監控
★ 橢圓辨識演算法之最佳化與誤差分析	★ 超音波定位平台原型開發
★ 跑步機馬達動態負載之量測	★ 鋰電池殘電量測系統及校正
★ 影像壓縮網路攝影平台	★ 智慧型網路攝影平台
★ 無扭力計跑步機跑者步態量測	★ ESEMS太空氣象科學酬載叢集
★ 影像辨識測試平台的開發	★ 智慧型網路攝影機開發平台
★ LTCC 陶瓷基板雷射切割研究	★ 回收艙酬載之電源系統開發與性能測試
★ 工業用智慧型高解析網路攝影機	★ 星象模擬器之開發

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

至系統瀏覽論文 ( 永不開放)

摘要(中)

為了取得電極間的距離進而控制電鍍的程序因此進行了電鍍時的溶液電阻量測研究，我們發現使用頻率為90kHz或是更高頻率之交流測試訊號可以使得電雙層電容與極化電阻相對於存在於電極間之溶液電阻而言變得可以忽略。因此，溶液阻抗的量測變得可行。
當包覆在粗的塑脂絕緣鞘中的細電極在近距離面對導電平板，因為狹窄通道效應會限制了有效的導通區域為電極下的截面積，因此有效的溶液電阻與間距會呈現一負相關。對125uM直徑的電極而言，間距在150μm以下都會有通道效應。藉此關係可以進行精密的導體表面輪廓掃描。
當電極與平板陰極的距離大於150uM以上，或者當析出之針狀物高度大於這個值以後，容液電阻值與電極間距的關係不再明顯，而不像導線中帶電粒子有集中式的通道而呈現與長度有正比的關係。因而無法用溶液電阻值來反映電極間距。

摘要(英)

Studying the measurement of solution resistance in electro-plating so as to derive the information on the distance between electrodes for the control of the electro-plating process, we found an AC test signal of frequency 90KHz or higher renders the impedence of the double layer capacitance and the polarization resistance negligible to the solution resistance between the electrodes. Therefore, the measurement of solution impedance becomes possible.
When a thin electrode is insulated by a thick epoxy sheath and with the tip face of the electrode brought very close to a flat conducting plate electrode, channel effect would constrain the effective conducting section to the area directly underneath the electrode tip. The effective solution resistance and distance between electrodes exhibit a negative correlation. As the gap distance becomes larger, the conducting cross section becomes wider and the solution resistance becomes smaller. For an electrode of 125uM, the channel effect is apparent in gap shorter than 150uM. Precision surface shape scanning was developed applying this discovery.
When the distance between the electrode and the plate electrode becomes bigger than 150uM, or when the height of the deposit grows longer than this value, the solution resistance becomes irrelevant to the distance between the electrodes. The channel for catalytic ions is distributed throughout the space around the electrodes, unlike the conducting wire constraining the conduction evenly in the cross section of the conductor. Therefore, it is ineffective to derive gap distance from the solution resistance.

關鍵字(中)

★ 溶液電阻
★ 電雙層電容
★ 極化電阻
★ 頻率響應
★ 電極間距
★ 微陽極電鍍

關鍵字(英)

★ micro anode guided electroplating
★ electrodes distance
★ frequency response
★ polarization resistance
★ solution resistance
★ double-layer capacitance

論文目次

論文摘要 I
致謝 II
目錄 III
圖目錄 V
表目錄 VIII
第一章緒論 1
第一節背景說明： 1
第二節需求說明： 2
第三節前案說明： 2
第四節本文貢獻： 3
第五節論文架構： 3
第二章電化學交流阻抗理論 4
第一節電化學槽之等效電路模型 4
2.1.1 Randles Cell 等效電路模型 6
2.1.2其他Schematic Diagram 7
第二節電化學交流阻抗量測理論與方法 10
2.2.1交流阻抗量測理論 10
2.2.2量測方法介紹 13
第三章系統架構 16
第一節系統目的 16
第二節系統架構與模組 16
第三節系統規格: 18
第四節系統各硬體模組說明: 18
3.4.1 PC端控制與數據處理模組 19
3.4.2 DSP核心控制模組 20
3.4.3 恆電位/電流儀 21
3.4.4 頻率響應分析儀 23
3.4.5 三軸微步進馬達驅動模組 26
第四章實驗設計與討論 29
第一節實驗設置 29
4.1.1 實驗器材准備 29
4.1.2 實驗測試流程 31
4.1.3 Dummy測試實驗 33
4.1.4 Dummy Cell等效元件改變量測 37
第二節掃描測試: 39
4.2.1 電化學槽交流阻抗測試 39
4.2.2 電化學槽定頻交流掃描測試 41
4.2.3 未加工之導電平板高頻交流阻抗分析 50
4.2.4 穿孔加工之導電平板高頻交流阻抗分析 52
第五章結論 59
第一節本文貢獻 59
第二節未來展望 59
參考文獻 60

參考文獻

[1] Hecht, O., Dishon, G.,”Automatic Optical Inspection (AOI)”, Electronic Components and Technology Conference, 1990. Proceedings., 40th, Vol. 1, 1990, pp.659-661
[2] R. C. Restrick III,“An Automatic Optical Printed Circuit Inspection System”, Proc. SPIE, Solid-State Imaging Devices, Vol. 116, 1977, pp.76
[3] Atack D, Smith KCA” The scanning electron microscope - A new tool in fibre technology”, Pulp Pap Mag Can, Vol 1, 1956, pp.245-251
[4] Welland, M. E. McKinnon, A. W. Barnes, J. R. O'Shea, S.J., “Scanning probe microscopy”, Engineering Science and Education Journal, Vol. 1, 1992, pp.203-210
[5] Henry Guckel, Madison and Wis, “Formation of Microstructures by Multiple Level Deep X-ray Lithography with Sacrificial Metal Layers”, United States Patent 5190637, Mar. 2, 1993。
[6] R. Bruck, K. Hahn, J. Steinecker, “Technology Description Methods for LIGA processes”, J. Micromech. Microeng, Vol.5, 1995, pp.196-198。
[7] M. Abraham, J. Arnold, W. Ehrfeld, K. Hesch, H. Mobius, T. Paatzsch, C. Schulz, “Laser-LIGA: A Cost Saving Process for Flexible Production of Micro-structures”, SPIE, Vol. 2639, 1995, pp.164-173。
[8] Geoffey Prentice, “Electrochemical Engineering Principles”, 新月圖書代理, 1991。
[9] John D. Madden and Ian W. Hunter, “Three Dimensional Micro-fabrication by localized Electrochemical Deposition”, Journal of micro-electro-mechanical systems. Vol.5 No.1, Mar. 1996, pp24-32
[10] Ian W. Hunter, Serge R. Lafontaine and John D. Madden,“Three-Dimensional Micro-fabrication by localized Electrchemical Deposition and Etching”, United States Patent 5641391, Jun.24, 1997
[11] Lin, J. C., S. B. Jiang, et al., “Micro-electroplating of Nickel on Copper Substrate”, Hsin-Chu, Taiwan, 1998
[12] Lin, J. C. , T. K. Chang, et al., “Fabrication of Copper Columns by MAGE Process”, Nantou, Taiwan, 2004
[13] Lin, J. C., R. W. You, et al., “Potential Moni
toring at Open Circuit and Cathode Polarization by MAGE System with Nickel”, Kaohsiung, Taiwan, 2004
[14] Lin, J. C., S. B. Jiang, et al.,” The Effect of Electric Field on Fabricating Columns by MicroanodeGuided Electroplating (MAGE) process“, Automation 2005, Taichung, Taiwan, 2005
[15] Lin, J. C., S. B. Jiang, et al., “Effect of Electric Field on the Cross Section of Micrometer Nickel Columns Fabricated by MAGE Process”, Automation 2005, Taichung, Taiwan, 2005
[16] Lee, D. L., S. B. Jiang, et al., “Micro-electroplating Control System”, Automation 2000, Taipei, Taiwan, 2000
[17] Lin, J. C., S. B. Jang, et al., “Fabrication of mi
crometer Ni columns by continuous and intermittent micro anode guided electroplating“, J. Micromech. Microeng. Vol. 15, 2005, pp.2405–2413
[18] Lee, D. L., Lin, J. C. et al., “Micro-anode Guided Electroplating (MAGE) Control System” , Materials Science Forum Vols.,2006, pp.505-507
[19] Gamry Instruments’Application Note “Electrochemical Impendence Spectroscopy Theory: A Primer ”網址：http://www.gamry.com/App_Notes/EIS_Primer/EIS_Primer.htm
[20] 陳金德 (民94)，電場輔助無電鍍鎳之研究，私立逢甲大學材料與製造工程材料工程碩士論文。
[21] Gamry Instruments’Application Note “Determination of Double-Layer Capacitance form a CPE”網址：http://www.gamry.com/App_Notes/PDF/jovic.pdf
[22] John Edward Brough Randles 介紹網址：http://chem.ch.huji.ac.il/~eugeniik/history/randles.html
[23] Jer-Nan Juang NASA Langley Research Center ”Applied System Identification” Chapter 1.
[24] Gene F. Franklin J. David Powell Abbas Emami-Naeini “Feedback control of dynamic systems Forth Edition” Chapter 3.
[25] 林銀議 (民94)，信號與系統，二版二刷
[26] Paul Horowitz，Winfield Hill，THE ART OF ELECTRONICS Second Edition.
[27] Solartron Analytical Electrochemical Analysis’Application Note TECHNICAL REPORT NUMBER 004/83
“IDENTIFICATION OF ELECTROCHEMICAL PROCESSES BY FREQUENCY RESPONSE ANALYSIS” Chapter 1
網址：http://www.solartronanalytical.com/products/applications/electrochemistry/index.php
[28] Princeton Applied Research’Application Note 網址：http://www.princetonappliedresearch.com/
[29] Solartron Analytical Electrochemical Analysis’Application Note TECHNICAL REPORT NUMBER 004/83“IDENTIFICATION OF ELECTROCHEMICAL PROCESSES BY FREQUENCY RESPONSE ANALYSIS” Chapter 2網址：http://www.solartronanalytical.com/products/applications/electrochemistry/index.php
[30]Electrochemistry for Corrosion R.A. Cottis and A. Llewllyn網址：http://www.cp.umist.ac.uk/lecturenotes/Echem/cellfile.html
[31] MAGELLAN BIOSCIENCES The Working Electrode-Introduction 網址：http://www.esainc.com/theory/coulometric/esaelectrode.html
[32] Resources for Electrochemistry’ Application Note 網址：http://www.consultrsr.com/index.htm
[33] Electrochemistry for Corrosion R.A. Cottis and A. Llewllyn-The Reference Electrode Section網址：
http://www.cp.umist.ac.uk/lecturenotes/Echem/cellfile.html
[34] Analog Device Embedded Processing & DSP網址：
http://www.analog.com/processors/processors/ADSP/
[34] Analog Device AD9833 Programmable Waveform Generator網址：
http://www.analog.com/en/prod/0,,770_843_AD9833,00.html
[35] CSIM CSD-205H 微步進馬達驅動器網址：
http://www.csim.com.tw/csd205h.html
[36] ADLINK PCI-8134 四軸運動控制卡網址：
http://www.adlinktech.com/PD/big5/PD_detail.php?cKind=FN&pid=132&seq=&id=&sid=
[37] Owen, B. B. & Gurry, R. W., “The Electrolytic Conductivity of Zinc Sulfate and Copper Sulfate in Water “, J. Amer. Chem. Soc. Vol. 40, 1938, pp. 3074

指導教授

葉則亮(Tse-Liang Yeh)

審核日期

2007-7-30

推文