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姓名 黃建鈞(Chien-chun Huang)  查詢紙本館藏   畢業系所 機械工程學系
論文名稱 環形旋塗流動不穩定之研究
(Fingering Instability of Ring Injection during Spin Coationg)
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摘要(中) 液體在旋轉塗佈過程中,由於離心力之作用,使不穩定手指狀會在連續液膜波前處產生。本實驗針對旋轉塗佈過程中,中心塗佈與環形塗佈不穩定手指狀流的產生,進行探討及研究,希望藉由環形旋塗研究來控制螺旋旋塗之不穩定手指數;實驗中利用晶圓不同的距離、不同機台轉速,不同的初始狀態及計算方式,進行塗佈半徑與面積相關聯之比較,藉此觀察旋轉塗佈過程中,距離、轉速以及初始塗佈的狀態,對流體連續薄膜波前發展的現象,並與相對應的中心塗佈比較,藉以研究兩者塗佈不穩定手指狀流相關的影響,以達到理想的塗佈臨界半徑與塗膜液體減量的效果。實驗結果發現在高黏度矽油低邦得數下,中心塗佈可以獲得比環形塗佈好的塗佈半徑,且中心旋塗初始半徑越大可以獲得較佳的塗佈面積。而環形塗佈不管距離遠近,都較中心塗佈易受初始狀態的影響。在兩者相對應關係的探討中,中心塗佈與環形塗佈兩者有形狀上的差異,此種差異會造成比較方式上的問題,所以利用不同的計算方式進行比較,發現外徑法因只單純計算臨界半徑的長度,故能減低初始條件對於臨界半徑的影響,因此此種計算方式較其它種能消除外在的因素,更能獲得較佳的比較。
摘要(英) In spin coating, the instability fingers would arise at the front of continuous liquid film wave due to the centrifuge. This experiment was studied the generation of fingering instability and the maximum attainable radius during the Center Injection and the Ring Injection. Hope to control the instability fingers of Spiral Injection. Different wafer distance, different rotational speed, different initial state, and different computing ways were used to compare the coating radius and area and to observe if the instability fingers would arise at the front of continuous liquid film wave that the photoresist decrement and the ideal critical radius of coating could be achieved. The results showed that in high viscosity silicon oil and low Bond number, the Center Injection could get better radius than Ring Injection, and the lager initial radius could get better coating area. Furthermore, Ring Injection was easier affected by the initial state than Center Injection. Compare to the result of two relations, Center Injection and Ring Injection are different in the structure, and this kind of difference would cause some problems in the comparative way. If we compare to the different calculation ways, it could find that the decrease of external diameter could lower affect by initial state than other factors.
關鍵字(中) ★ 旋轉塗佈
★ 環形旋塗
★ 不穩定手指狀
關鍵字(英) ★ Spin Coating
★ Ring Injection
★ Finger instability
論文目次 摘要 I
Abstract II
致謝 III
目錄 IV
表目錄 VI
圖目錄 VII
符號說明表 VIII
第一章 緒論 1
1-1 前言 1
1-2 文獻回顧 2
1-2.1 旋轉塗佈相關文獻回顧 2
1-2.2 風剪效應相關文獻回顧 5
1-2.3 不穩定手指狀流相關文獻回顧 6
1-3 研究動機 10
第二章 實驗設備與方法 11
2-1 影像擷取系統 12
2-2 旋轉塗佈實驗設備 13
2-3 實驗方法 14
2-4 實驗步驟 15
第三章 結果與討論 18
3-1 注液速度與注液量及塗佈距離對環形旋塗之影響 18
3-1.1 機台旋轉速度與高度對環形旋塗之影響 18
3-1.2 環形塗佈不穩定手指產生的情形 19
3-1.3 中心塗佈與不同距離環形塗佈之邦得數比較 20
3-1.4 中心塗佈與不同距離環形塗佈之塗佈情形 21
3-1.5不同距離環型塗佈之邦得數與Rc/V1/3比較 22
3-1.6不同距離環型塗佈之邦得數與Rout/Ro,1比較 23
3-1.7 不同距離旋塗之邦得數與波長比較 23
3-1.8 不同距離旋塗邦得數與不穩定手指數目比較 24
3-2 環形塗佈與中心塗佈不同計算方式之對應關係 25
3-2.1 環形塗佈與中心塗佈邦得數與Rc/V1/3之對比 25
3-2.2 環形塗佈與中心塗佈旋轉邦得數與Rc,a/V1/3之對比 26
3-2.3 環形塗佈與中心塗佈邦得數與Rout/Ro,1之對比 27
3-2.4 環形塗佈與中心塗佈邦得數與Rc,o/V1/3之對比 28
第四章 結論 29
參考文獻 31
參考圖表 35
參考文獻 1. A. G. Emsilie, F. T. Bonner, and L. G. Peck, Flow of a Viscous Liquid on a Rotating Disk, J. Appl. Phys., Vol 29, pp. 858-863(1958).
2. E. Momoniat, and D. P. Mason, Investigation of the Coriolis Force on a Thin Fluid Film on a Rotating Disk, Int. J. Non-Linear Mech.,Vol 31, pp. 1069-1088,(1998).
3. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk,J. Appl. Phys., Vol.61, pp. 1034-1037(1978).
4. A. Acrivos, M. Shan, and E. E. Petersen, On the Flow of a Non-Newtonian Liquid on a Rotating Disk, J. Appl. Phys., Vol 31, pp. 963-968(1960).
5. D. E. Bornside, C. W. Maccsko, and L.E., Scriven, Spin Coating: One-Dimensional Model, J. Appl. Phys., Vol. 66, No. 11, pp. 5185-5193(1989).
6. M. L. Forcada, and C. M. Mate, The Flow of Thin Lubricant Films on Rotating Disks, Wear, Vol. 168, pp. 21-25(1993).
7. D. Meyerhofer, Characteristics of Resist Films Produced by Spinning, J. Appl. Phys., Vol. 49, pp. 3993-3997(1978).
8. T. Yada, T. Maejima, M. Aoki, and M. Umesaki, Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist, Jpn. J. Appl. Phys.,Vol. 34, pp. 6279-6284(1995).
9. T. Yada, T. Maejima, and M. Aoki, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity, Jpn. J. Appl. Phys., Vol. 36, pp. 7041-7047(1997).
10. T. Yada, T. Maejima, M. Aoki, and M. Ishizu, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Temperature, Jpn. J. Appl. Phys., Vol. 36, pp. 372-377(1997).
11. T. Yada, Formation of a Negative Photoresist Thin Film by Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 2752-2757(1998).
12. W. W. Flack, D. D. Soong, A. T. Bell, and D. W. Hess, A Mathematical Model for Spin Coating of Polymer Resist, J. Appl. Phys., Vol. 56,pp. 1199-1206(1984).
13. B. G. Higgins, Film Flow on a Rotating Disk, Phys. Fluids, Vol. 29, pp. 3522-3529(1986).
14. C. T. Wang and S. C. Yeu, Theoretical Analysis of Film Uniformity in Spinning Processes, Chem. Eng. Sci., Vol. 50, pp. 989-999(1995).
15. J. H. Hwang, and F. Ma, On the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys. Vol. 66, pp. 388-394(1989).
16. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film Over a Rough Rotating Disk, ASME J. Appl. Phys., Vol. 112, pp. 165-168(1990).
17. J. Gu, M. D. Bullwinkel, and G. A. Campbell, Spin Coating on Substrate with Topography, J.Electrochem. So., Vol. 142, pp. 907-913(1995).
18. R. K. Youkoski, and D. S. Soane, Model for Spin Coating in Microelectronic Applications, J. Appl. Phys., Vol. 72, pp. 725-740(1992).
19. S. Middleman, The Effect of Induced Air-Flow on the Spin Coating of Viscous Liquids, J. Appl. Phys., Vol. 62, pp. 2530-2532(1987).
20. F. Ma,and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquids Film over a Rough Rotating Disk, ASME J. Appl. Phys,. Vol. 112, pp. 165-168(1990)
21. T. J. Rehg, and B. G. Higgins, The Effect of Inertia and Interfacial Shear on Film Flow on a Rotating Disk, Phys. Fluids, Vol. 31, pp. 1360-1371(1988).
22. W. H. McConnell, On the Rate of Thin Liquid Films on a Rotating Disk, J. Appl. Phys., Vol. 64, pp. 2232-2233(1988).
23. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, pp. 1034-1037(1987).
24. S. C. Gong, and F. C. Chou, Effect of Windshear on the Film Thickness Distribution over Rotating Doughnut Disks, Jpn. J. Appl. Phys., Vol. 36, pp. 380-384(1997).
25. F. C. Chou, and P. Y. Wu, Effect of Air Shear on Film Planarization during Spin Coating, J. Electrochemical Society, Vol. 147, pp. 699-705(2000).
26. L.W. Schwartz, Viscous Flow Down an Inclined Plane: Instability and Finger Formation, Phys. Fluids A, Vol. 1, pp. 443-445(1989).
27. S. M. Troian, E. Herbolzheimer, S. A. Safran and J. F. Joanny, Fingering Instabilities of Driven Spreading Film, Europhys. Lett., 10(1), pp. 25-30(1981).
28. F. Melo, J. F. Joanny, and S. Fauve, Fingering Instability of Spinning Drops, Phys. Review Letters, Vol. 63, pp. 1958-1961(1989).
29. N. Fraysse and G. M. Homsy, An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids, Phys. Fluids, Vol. 6, pp. 1491-1504(1994).
30. M. A. Spaid, and G. M. Homsy, Stability of Viscoelastics Dynamic Contact Lines: An Experimental Study, Phys. Fluids, Vol. 9, pp. 823- 834(1997).
31. S. K. Wilson, R. Hunt, and B. R. Duffy, The Rate of Spreading in Spin Coating, J. Fluid Mech., Vol. 413, pp.65-88(2000).
32. F. C. Chou, S. C. Gong, M. W. Wang, and K. T. Lie, On the Reduction Liquid Dispensed in Spin Coating, ASME Fluids Engineering Division Summer Meeting, Vol. 4, pp. 553-558(1996).
33. F. C. Chou, S. C. Gong, and M. W. Wang, Reduction of Photoresist Usage during Spin Coating, Journal of Electronic Materials, Vol. 30, pp. 432-438(2001)
34. 周復初,卓浩江和王明文,「轉速對旋轉塗佈液膜穩定的影響」,中國工程師學會第十六屆全國學術研討會,第五冊 pp. H049-H054,民國八十八年十二月。
35. F. C. Chou, H. J. Juo, M. W. Wang and S. J. Dai, Effect of Injection Rate on Fingering Instabilities during Spin Coating, Procs. of 8th International Symposium on Transport Phenomena and Dynamics of Rotating Machinery (ISROMAC-8), Vol. 2, pp. 500-505(2000).
36. M. W. Wang, and F. C. Chou, Fingering Instability and Maximum Radius at High Rotational Bond Number, J. Electrochem. Soc. , Vol.148 pp. 283-290 (2001).
37. F. C. Chou, P. Y. Wu, and S. C. Gong, Analytical Solutions of Film Planarization during Spin Coating, Jpn. J. Appl. phys., Vol. 37, pp. 4321-4327(1998).
38. P. Y. Wu, and F. C. Chou, Complete Analytical Solutions of Film Planarization during Spin Coating, J. Electrochemical Society, Vol. 146, pp. 3819-3826(1999)
39. M. W. Wang, H. K. Yu, and F. C. Chou, Effect of A Prewetting Thin Film on Fingering Instabilities during Spin Coating, The 3rd Pacific Symposium on Flow Visualization & Image Processing, F3058, 1-7, Maui Hawaii, USA(2001).
40. F.C. Chou, and K.H. Huang, Reduction of Amount of Dye during Spin Coating, Japanese Journal of Applied Physics Vol. 45, pp. 1757–1764(2006).
41. 洪漢斌,「環形塗佈手指狀之不穩定研究」,國立中央大學,碩士論文,民國九十五年
指導教授 周復初(Fu-chu Chou) 審核日期 2007-7-10
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