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姓名	邱淑貞(Shu- Zhen Chiu)  查詢紙本館藏	畢業系所	機械工程學系
論文名稱	有機系統DMF溶液電鍍鎂鎳合金薄膜之研究 (Co-deposition of magnesium and nickel thin film on copper substrate in DMF)
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摘要(中)	本論文在探討自含鎂、鎳離子之氮,氮-二甲基甲醯胺(N, N-dimethylformamide DMF)有機鍍液中共鍍鎂、鎳薄膜於銅基材上的可行性。首先添加螯合劑(如檸檬酸及硼酸)至上述電解液中，期望藉由拉近Mg/Ni兩種金屬的還原電位，來共鍍鎂、鎳薄膜。經由電化學陰極動態極化法研究之結果顯示: 在鍍浴中，若陰極電位控制在-0.8VSHE以上時，觀察到氣泡的產升，推測為氫氣產生之反應；電位在-0.8VSHE至-1.3VSHE間，析鍍出具光澤性之金屬，推測為金屬鎳之鍍出；電位在-1.3VSHE以下，析鍍出黑色薄膜，推測為鎂、鎳薄膜之共鍍。 在定電位下進行鎂、鎳薄膜共鍍時，若分別改變DMF鍍液中Mg2+和Ni2+離子濃度，則薄膜鍍層之形貌及其中鎂、鎳組成比例均有變化，鍍膜中的Mg/Ni比例，隨鍍浴中Mg2+濃度增加而增大，但隨Ni2+濃度增加而減小。若鍍浴中Mg2+濃度固定為1.00 M，可由鍍膜中鎂、鎳組成之分析，來推算鍍浴中Mg2+,Ni2+離子之活性係數。在-1.6VSHE與-1.8電位下共鍍鎂、鎳薄膜程序中，其所伴隨之氫氣產生，不僅影響電流效率，亦會影響鍍膜中的Mg/Ni組成比例。 薄膜之儲氫放電容量電化學測試顯示:在含1.00M Mg2+離子和0.10M Ni2+離子DMF鍍浴中，添加0.048 M檸檬酸及0.024 M硼酸下，於-2.2VSHE電位下所得之鍍膜，其儲氫放電容量値最大 (約為150mAh/g)。
摘要(英)	Co-deposition of magnesium and nickel from an organic bath of N, N-dimethylformamide containing both these ions onto copper substrate has been investigated. Chelating agent such as citrate was added in the bath to form complex with nickel so that the reduction potentials of Mg and Ni could be pulled closely and make the co-deposition possible. Potentiodynamic polarization on the cathode provided an useful information on the co-deposition. The bubbles evolved at potential higher than -0.8 V were considered as hydrogen gas; the lustered film deposited in the potential from -0.8 to -1.3V was inferred as metallic nickel and the dark film deposited at potential lower than -1.3V was a co-deposition film of Mg-Ni When the co-deposition performed potentiostatically in the DMF, the morphology and composition of the deposit were found to depend on the concentrations of Mg2+ and Ni2+ in the bath. The compositional ratio of Mg to Ni in the deposit increases with increasing the concentration of Mg2+ but decreases with Ni2+ concentrations. For the co-deposition conducted in a DMF solution containing 1.0 M Mg2+, the activity coefficient of Mg and Ni ions could be estimated by virtue of composition analysis on the film. Hydrogen evolution not only affected the current efficiency of the process but also influenced the composition of Mg and Ni in the deposit when the co-deposition of Mg-Ni performed at the potential in between -1.6 and -1.8 V. Hydrogen storage and its discharge capacity in the Mg-Ni binary films could be evaluated using electrochemical method. The Mg-Ni film, deposited at -2.2 V from DMF solution containing 1.0 M Mg2+ and 0.1 M Ni2+ in the presence of 0.48 M citrate and 0.024 M boron acid, revealed the highest capacity in hydrogen storage and discharge DMF solution. analysis demonstrated that the Mg-Ni hydrogen storage thin film exhibited the highest capacity (i.e., 150mAh/cm2) in the hydrogen storage discharge.
關鍵字(中)	★ 放電容量 ★ 合金電鍍 ★ 鎂鎳合金	關鍵字(英)	★ Mg-Ni co-deposition ★ hydrogen storage and discharge ★ DMF
論文目次	中文摘要 英文摘要 致謝 目錄 表目錄 圖目錄 第一章 前言 1.1氫能源發展現況 1.2儲氫合金簡介 1.3儲氫元素與合金 1.3.1 儲氫元素 1.3.2 儲氫合金 1.4儲氫合金的應用 1.4.1 儲氫容器 1.4.2 氫純化 1.4.3 熱泵 1.4.4 電動車用電池 1.4.5 催化劑 1.5鎂基儲氫材料製備方法 1.5.1高溫熔煉法 1.5.2機械合金化 1.5.3燃燒合成法 1.5.4燒結法 1.5.5電鍍法 1.6本論文研究之動機與目的 1.6.1 研究動機 1.6.2 研究目的 第二章、文獻回顧 2.1 非水溶液電鍍 2.1.1 非水溶劑分類 2.1.2 非水溶劑的要求 2.1.3 非水溶液鍍鋁 2.2 鎂的基本化學特性 2.3 鎂的電鍍方法 2.3.1 有機溶液系統 2.3.2 離子溶液系統 2.4 鎳的基本化學特性 2.5鎳的電鍍方法 2.6 鎂鎳合金的電鍍原理 2.6.1 平板電鍍原理 2.6.2 合金電鍍原理 2.7合金充放電原理 2.7.1定電壓充電法 2.7.2定電流充電法 第三章、實驗方法 3.1 實驗裝置 3.1.1試片製備 3.1.2 電鍍槽裝置 3.1.3 溶液配置 3.2 實驗流程 3.2.1 電化學分析實驗 3.2.1.1動態極化實驗 3.2.1.2循環伏安法 3.2.2 合金電鍍實驗 3.2.2.1 濃度參數變化實驗 3.2.2.2 電位參數變化實驗 3.2.3 充放電性能實驗 3.3 儀器設備 3.3.1 實驗儀器 3.3.2 檢測儀器 第四章 實驗結果 4.1電化學實驗結果 4.1.1循環伏安實驗 4.1.2極化曲線實驗結果 4.2 Mg/Ni合金形貌成分 4.2.1 SEM形貌觀察 4.2.2 EDS 成分定性 4.3 Mg/Ni溶液的電流密度比較 4.4 Mg/Ni溶液的沉積比例預測 4.5 合金析鍍實驗ICP結果 4.5.1 濃度矩陣之影響 4.5.2 電位參數之影響 4.6 XRD 結構分析 4.7 Mg/Ni合金的放電容量 第五章 結果討論 5.1製備含Mg/Ni合金之可行性 5.1.1水溶液與DMF溶液之還原電位 5.1.2析鍍電位對鍍層結構成分的影響 5.2 鍍液中Mg2+/Ni2+離子濃度對合金之影響 5.3 鍍液中析鍍電位對合金之影響 5.4 含Mg2Ni成分合金之充放電 第六章 結論 第七章 未來展望 參考文獻
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指導教授	林景崎(J.C. Lin)	審核日期	2008-7-15
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