參考文獻 |
參考文獻:
英文文獻:
Anderson H. M., Merson J.A., and Light R. W., (1986), "A kinetic model for plasma etching in a SF6/O2 RF discharge", IEEE Trans. Plasma Sci., vol. 14, 156.
Altavilla C., Ciliberto E., (2004), "Decay characterization of glassy pigments: an XPS investigation of smalt paint layers", Dipartimento di Scienze Chimiche, Universita di Catania, Viale Andrea Doria 6, 95125 Catania, Italy., Appl. Phys. A, vol. 79, 309.
Belhaouari J. B., Gonzales J. S., and Gleizes A., (1998), "Simulation of a decaying SF6 arc plasma: hydrodynamics and kinetics coupling study", J. Phys. D, vol. 31, 1219.
Casanovas A. M. and Casanovas J., (2004), “Decomposition of high-pressure (400 kPa) SF6-CO2, SF6-CO, SF6-N2-CO2 and SF6-N2-CO mixtures under negative dc coronas”, J. Phys. D: Appl. Phys. Vol. 38, 1556.
Chen X., Marquez M., Rozak J., Marun C., Luo J., Suib S. L., Hayashi Y. and Matsumoto H., (1998), “Research Note: H2O splitting in tubular plasma reactors”, J. Catalysis, vol. 178, 3727.
Edelson D. and Flamm D. L., (1984), "Computer simulation of a CF4 plasma etching silicon," J. Appl. Phys., vol. 56, 1522.
Fujimi M., Suwa G. and Nagano K., (2001), “PFC emissions reductions in the semiconductor operations division at Deiko Epson Corporation”, ISESH 8th Annual Conference, Kenting, Taiwan.
Herron J. T. and Van Brunt R. J., (1989), "Zonal model for corona discharge-induced oxidation of SF6 in SF6/O2/H2O gas mixtures", Proc. 9th Int. Symp. on Plasma Chemistry, University of Bari, Italy.
Hung M. C., Yang C. L., Wu P. H., Pan S. M. and Huang Y. S., (2001), “Reduction of NF3 usage for optimal AMAT HDP clean recipe”, ISESH 8th Annual Conference, Kenting, Taiwan.
Hitachi S. T. and Hitachi S. K., (1998), “Catalytic decomposition of PFC”, A Partnership for PFC emissions reductions, Technical program present, Texas.
Huang A., Xia G., Spiess F. J., Chen X., Rozak J., Suib S., Takahashi T., Hayashi Y., and Matsumoto H., (2001), “Combination of glow-discharge and arc plasmas for CF4 abatement”, Res. Chem. Intermed., vol. 27, no. 9, 957.
Ibuka S., (1998), Japan’s use of ClF3, A partnership for PFC emissions reductions, Technical Program Present, Texas.
Ji B., Elder D. L., Yang J. H., Basowski P. R. and Karwacki E. J., (2004), “Power dependence of NF3 plasma stability for in situ chamber cleaning”, J. Appl. Phys., vol. 95, no. 8, 4446.
Kuroki Y., Mine J., Okubo M., Yamamoto T. and Saeki N., (2005), “CF4 decomposition using inductively coupled plasma: Effect of power frequency,” IEEE Trans. Ind. Appl., vol 41, no. 1, 215.
Kim Y., Kim K. T., Cha M. S., Song Y. H. and Kim S. J., (2005), “CF4 decompositions using streamer and glow-mode in dielectric barrier discharges,” IEEE Trans. Plasma Sci., vol. 33, no. 3, 1041.
Kurte R., Beyer C., Heise H. M., Klockow D., (2002), ”Application of infrared Spectroscopy to monitoring gas insulated high-voltage equipment:electrode material-dependent SF6 decomposition” , Ana.l Bioana.l Chem., 639.
Kuroki T., Mine J., Okubo M., Yamamoto T. and Saeki N., (2005), “CF4 decomposition using inductively coupled plasma: effect of power frequency”, IEEE Trans. Ind. Appl., vol. 41, no. 1, 215.
Kuroki T., Tanaka S., Okubo M. and Yamamoto T., (2004), “Experimental and numerical investigations for CF4 decomposition using RF low pressure plasma”, IEEE Trans. Ind. Appl., 592.
Levy R. A., Zaitsev V. B., Aryusook K., Ravindranath C., Sigal V., Misra A., Kesari S., Rufin D., Sees J., and Hall L.,(1998), “Investigation of CF3I as an environmental benign dielectric etchant”, J. Materials Research, vol. 13, no. 9, 2643.
Moulder J. F., Stickle W. F., Sobol P. E., Bomben K. D., (1995), “Handbook of X-ray photoelectron spectroscopy”, Physical Electronics, Inc., Minnesota 55344 United States of America.
Novak J. P. and Frechette M. F., (1984), "Transport coefficients of SF6 and SF6-N2 mixtures from revised data", J. Appl. Phys., vol. 55, 107.
Polak L. and Lebedev Y. A., Eds., Plasma Chemistry. Cambridge, UK: Cambridge International Science., 1994.
Pruette L. C., Karecki S. M, and Reif R., (1998), “Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry”, J. Vaccum Sci. Technol. A, vol. 16, no. 3, 1577.
Raghunathan K. And Gullett B. K., (1996), “Role of sulfur in reducing PCDD and PCDF formation”, Environ. Sci. Technol., vol. 30, 1827.
Seeley S. P., Chandler P., Cottle S., and Mawle P., (1997), “Effective PFC gas abatement in a production environment”, Semiconductor Fabtech-10th Edition, BOC Edwards Exhaust Management Systems, Nailsea, UK.
Twigg M. V. and Spencer M. S., (2001), “Deactivation of supported copper metal catalysts for hydrogenation reactions”, Appl. Catalysis A, vol. 212, 161.
Urashima K., Kostov K. G.., Chang J. S., Okayasu Y., Iwaizumi T., Yoshimura K. and Kato T., (2001), “Removal of C2F6 from a semiconductor process flue gas by a ferroelectric packed-bed barrier discharge reactor with an adsorber”, IEEE Trans. Ind. Appl., vol. 37, no. 5, 1456.
Van Brunt R. J. and Herron J. T., (1994), "Plasma chemical model for decomposition of SF6 in a negative glow corona discharge", Physica Scripta, vol. 53, 9.
Worth W. F., (2000), “Reducing PFC emissions: A tech. update”, Future Fab International, Environmental/ Health an Safety, 57.
中文文獻:
吳關佑, (2002),“線管式與填充床式電漿反應器破壞SF6之初步研究,”國立中央大學環工所碩士論文, 中壢市。
游生任, (2000), “以介電質放電技術轉化四氟甲烷及六氟乙烷之初步探討”, 中央大學環境工程研究所論文, 中壢市。
李灝銘, (2001) ,“以低溫電漿去除揮發性有機物之研究,” 中央大學環境工程研究所論文,中壢市。
翁澤民, (2004),”觸媒焚化處理氣相甲苯之研究,”國立中山大學環工所碩士論文, 高雄市。
梁煜申,(2003), “鈀觸媒處理焚化廢氣中CO、NO之動力研究,” 國立中興大學環工所碩士論文, 台中市。
何立仁, (1992),“絕緣氣體SF6之介紹”,台灣大電力研究試驗中心, 桃園縣。
FTIR圖譜手冊
網路資料:
行政院原子能委員會核能研究所, ”PFCs排放控制處理技術之對照表,” http://www.iner.gov.tw/news/c-service/change/03.htm (download on 2005/10/5)
USEPA, (2002), “greenhouse gases and global warming potential values,” http://yosemite.epa.gov/oar/globalwarming.nsf/UniqueKeyLookup/SHSU5BUM9T/$File/ghg_gwp.pdf (download on 2005/10/16)
簡慧貞, 台灣環保署,“氣候變化綱要公約相關議題”, http://www.epa.gov.tw/gaiscgi/query_run.exe? (download on 2005/10/20)
台灣環保署, (2004), “93 環境白皮書”, http://www.epa.gov.tw/gaiscgi/nph-uc.exe?ofu=http://www.epa.gov.tw/a/a0300.asp?Ct_Code=03X0000102X0000387&ofn=九十三年(2004) (download on 2005/10/20) |