參考文獻 |
chapter 1
1. M. Hepher, J. Phot. Phot. Sci., 12, p.181 (1964)
2. Thomas F. Krauss, Photonic Integrated Circuits using Crystal Optics , final report 1-40, (2003)
3. P. Hudek, I.W. Rangelow, I.Kostic, N. Munzel, I. Daraktchiev, Microelectronic Engineering, 30, pp.309-312 (1996)
4. R. Schenk, O. Halle, K. Mullen, W. Ehrfeld, M. Schmidt, Microelectronic Engineering, 35, pp.105-108 (1997)
5. L. M. Minsk, J. G. Smith, W. P. Van Deusen, J. F. Wright, J. Appl. Polymer Sci., 2, 302 (1959)
6. The subsequent paragraph closely follows the account given by A. Reiser, Photoreactive Polymers – The Science and Technology of Resists, J. Wiley & Sons, New York, pp.18-20, (1989)
7. E. M. Robertson, W. P. Van Deusen, L. M. Minsk, J. Appl. Polymer Sci., 2, p.308 (1959)
8. R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Phot. Sci. Eng., 15, p.141 (1971)
9. E. Froschle, R. Backhus, Solid-State Electron., 14, p.95 (1971)
10. D. K. Smith, Phot. Sci. Eng., vol.12, p.263 (1968)
11. J. C. Chong, J. Appl. Polymer Sci., vol.13, p.241 (1969)
12. Osamu Morikawa, Hisatoshi Konishi, Chem. Mater., vol.11, pp.427-432 (1999)
13. H.A. Levine, Polymer Preprints, Div. Polymer Chemistry, Am. Chem. Soc., vol.10[1], p.377 (1969)
14. Y. Wada, Microelectronics Journal, vol.29, pp.601-611 (1998)
15. Shunji Goto, Kenji Sugishima and Yasutaka Ban, Radiat. Phys. Chem. Vol. 45, No. 3, pp.333-348 (1995)
16. L. F. Thompson, Solid State Technology, July, p.27 (1974)
17. L. F. Thompson, SPSE Winter Symoposium ’75 on Micro- Photofabrication, D p.1 (1975)
18. W. Morean, N. Vinswanathan, Ultraviolet Light Induced Reactions in Polymers, p.107, ACS Symp, Ser., No. p.25 (1976)
19. R. Feder, E. Spiller, J. Topalian, Tech. Papers 4th Tech. Conf. on Photopolymers, p.116, SPE (1976)
20. L. Van den hove and K. Ronse, Microelectronic Engineering, vol.27, pp.357-365 (1995)
Chapter 2.
1. R. Meldola, G. H. Woolcott, E. Wray, J. Chem. Soc., vol.69, p.1327 (1996)
2. O. Haba and H. Hiramoto, J. Macromol. Sci.-Chem., A21, p.1641 (1984)
3. M. Ueda and T. Nakayama, Macromolecules, vol.29, p.6427 (1996)
4. Nigel Farrar, Will Conley, Hareen Gangala, Carl Babcock, Hua-Yu Liu, Microelectronic Engineering, vol.46, pp.97-100 (1999)
5. K. Honda, B. T. Beauchamp, Jr., R. J. Hurditch, A. J. Blakeney, Y. Kawabe and T. Kobuko, SPIE Proc., 1262, p.493 (1990)
6. K. Honda, B. T. Beauchamp, Jr., E. A. Fitzgerald, A. T. Jeffries Ⅲ, S. P. Tadros, A. J. Blakeney, R. J. Hurditch, S. Tan and S. Sakagutchi, SPIE Proc., 1466, pp.141-148 (1991)
7. M. Murata, M. Koshiba and Y. Harita, SPIE Proc., 1086, p.48 (1989)
8. M. G. Moss, R. M. Cuzmar and T. Brewer, in ‘Advances in Resist Technology and Processing Ⅵ’, Proccedings of SPIE, Vol. 1086, Society of Photo-Optical Instrumentation Engineers, Bellingham WA, p.396 (1989)
9. S. Hayase, K. Takano, Y. Mikogami and Y. Nakano, J. Electrochem. Soc. Vol.138, p.3625 (1991)
10. D. N. Khanna and W. H. Mueller, Polym. Eng. Sci., 29, p.954 (1989)
11. T. Omote, H. Mochizuki, K. Koseki, and T. Yamaoka, Polymer Commun., vol.31(4), p.131 (1990)
12. R. Sezi, H. Ahne, R. Gestigkeit, E. Kuhn, R. Leuschner, E. Rissel and E. Schmidt, Proc. 10th internationnal Conference of Photopolymers, p.444 (1994)
13. A. Mochizuki, Y. Tamino, K. Yamada, and M. Ueda, J. Photopolym. Sci. Technol., vol.8(2), p.333 (1995)
14. H. Fuji-I, T. Omote, and S. Hayashi, Polymer Preprint, Japan, vol.42(7), p.2685 (1993)
15. H. E. Simmons Ⅲ, and D. R. Wipf, ACS Polym. Mater. Sci. Eng., vol.70, p.235 (1994)
16. J. Schmidt, W. Meier, Chem Ber., vol.64, p.776 (1931)
17. O. Sus, Licbigs, Ann. Chem., vol.556, pp.65-85 (1944)
18. R. Huisgen, Agew. Chem., vol.67, pp.459 (1955)
19. Katsuji Douki, Toru Kajita, and Shin-ichiro Iwanaga, SPIE, Vol. 3333, p.384 (1998)
20. Stanlry F. Wanat, M. Dalil Rahamn, Sunit S. Dixit, Ping-Hung Lu, Douglas S. McKenzie and Michelle M. Cook, SPIE, Vol.3333, p.1092 (1998)
21. H. A. Levine, Polymer Preprints, Div. Polymer Chemistry, Am. Chem. Soc., vol.10[1], p.377 (1969)
Chapter 3.
1. J.A. Van Kan, J.L. Sanchez, B.Xn. T. Osipowicz. F. Watt, Nuclear Instrument and Methods in Physics Research B vol.158, P. 179 (1999)
2. Jin Beak Kim, Jae Young Kim, Min Ho Jung, Polymer vol.40, pp.273-276, (1998)
3. Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa and Etsuo Hasegawa, IEICE TRANS. ELECTRON., Vol. E81-c, No.7, P.1045 (1998)
4. Young-Dae Kim, Sang-Jin Park, Haiwon Lee, Eung-Ryul Kim, Sang-Jun Choi and Si-Hyeung Lee, JPn. J. Appl. Phys., Vol.37, Pt.1, No.12B (1998)
5. Kaimoto, Y, Nozaki K, Takechi S, Abe M, Proc SPIE, 1672:66 (1992)
6. Takechi S, Takahashi M, Kotachi A, Nozaki K, Yano E, Hanyu I, J. Photopolym. Sci. Technol., vol.9, p.475 (1996)
7. Shida N, Ushirogouchi T, Asakawa K, Nakase M, J. Photopolym. Sci. Technol., 9, 457 (1996)
8. Allen RD, Wallraff GM, Dipietro RA, Hofer DC, Kunz RR, Proc SPIE, vol.2483, p.474 (1995)
9. Nakano K, Maeda K, Iwasa S, Yano J, Ogura Y, Hasegawa E, Proc SPIE, vol.2195, p.195 (1994)
10. Maeda K, Nakano K, Ohfuji T, Hasegawa E, Proc SPIE, pp.2724:377 (1996)
11. V. White, R. Ghodssi, C. Herdey, D.D. Denton and L. McCanghan, Appl. Phys. Lett. 66(16), 17 April, P.2072 (1995)
12. Rong-Jer Lee, Jr-Cheng Fan, Tzong-Shing Cheng and Jung-Lung Wu, ASID, 17th, P.395 (1999)
13. Nigel Farrar, Will Conley, Hareen Gangala, Carl Babcock, Hua-Yu Lin, Microelectronic Engineering, vol.46, p.97~100 (1999)
14. Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa, IEICE TRANS. ELECTRON., vol.E81-C, no.7, July (1998)
Chapter 4.
1. P. J. Ross, Taguchi Techniques for Quality Engineering: Loss Function, Orthogonal Experiments, Parameter and Tolerance Design, Phillip J. Ross, McGraw-Hill, New York, (1996)
2. 鄭燕琴, 田口品質工程技術與實務, 中華民國品質管制學會 (1995)
3. J. Zhang, K. L. Tan, H. Q. Gong, Polymer Testing, vol.20, pp.693-701 (2001)
4. 林弘雯, 邱文英, 鄭國忠, PMMA系列光阻劑之製備及特性研究, 第二十屆高分子研討會 (1999)
Chapter 5.
1. 許嘉紋、鄭宗興、李欣縈、李清庭、陳暉,材料研討會P07-15 (2001)
2. C. D. Diakoumakos, I. Raptis, A. Tserepi, P. Argitis, Polymer, vol.43, pp.1103-1113 (2002)
3. C.G. Khan Malek, Microelectronics Journal, vol.33, pp.101-105 (2002)
4. M.W. Borner, M. Kohl, F.L. Pantenburg, W. Bacher, H. Hein and W.K. Schomburg, Microelectronic Engineering vol.30, pp.505-508 (1996)
5. 楊啟榮、馬偉中、周曉宇、李育德、陳建人、黃文雄, 第三屆奈米工程及微系統技術研討會, p.3-145 (1999)
6. K.Y. Lee, N. LaBianca, S.A. Rishton, S. Zolgharnain, J.D. Gelorme, J. Shaw and T.H.P. chang, J. Vac. Sci. Technol., B13(6) pp.3012-3016 (1995)
7. N. LaBianca, J.D. Gelorme. SPIE vol. 2438, pp.846-849 (1994)
8. H. Lorenz, M. Despont, N. Fahrui, J. Brugger and P. Renand, Sensors and Actuators, A64, pp.33-39 (1998)
9. A. Rehab, Eur. Polym. J., vol.34, no.12, 1845-1855 (1998)
10. W. Y. Chiang, H.T. Kuo, European Polymer Journal, vol.38, pp.1761-1768 (2002)
11. J. S. Lee, S. I. Hong, European Polymer Journal, vol.38, pp.387-392 (2002)
12. M. Sato, M. Iijima, Y. Takahashi, Thin Solid Films, 308-309, pp.90-93 (1997)
Chapter 6.
1. D. J. Meier and S. H. Schmidt, PCB Laser Technology for Rigid and Flex HDI: Via Formation, Structuring and Routing, CircuiTree, Oct. 01 (2002)
2. K.Y. Lee, N. LaBianca, S.A. Rishton, S. Zolgharnain, J.D. Gelorme, J. Shaw and T.H.P. Chang, J. Vac. Sci. Technol. B13(6) 3012-3016 (1995)
3. N. LaBianca, J.D. Gelorme. SPIE vol. 2438, 846-849 (1994)
4. H. Lorenz, M. Despont, N. Fahrui, J. Brugger and P. Renand, Sensors and Actuators A64, 33-39 (1998)
5. 鄭宗興、邱國展、莊妙如、李宗銘 “高密度自建構面陣列微電導體技術發展與現況” 電子與材料,vol.16, pp.35-39, November, (2002)
6. Bolger, J.C. Moraro, S. L., Adhesives Age, vol. 27, 17-20 (1984) |