博碩士論文 943204021 詳細資訊




以作者查詢圖書館館藏 以作者查詢臺灣博碩士 以作者查詢全國書目 勘誤回報 、線上人數:33 、訪客IP:3.133.147.87
姓名 游世明(Shih-ming You)  查詢紙本館藏   畢業系所 化學工程與材料工程學系
論文名稱 抗反射層製作與奈米孔洞二氧化矽薄膜應用在光致發光材料
(Fabrication of anti-reflective films and the photoluminescence of mesoporous silica)
相關論文
★ 醫療用氧氣濃縮機之改善與發展★ 變壓吸附法濃縮及回收氣化產氫製程中二氧化碳與氫氣之模擬
★ 變壓吸附法應用於小型化醫療用製氧機及生質酒精脫水產生無水酒精之模擬★ 變壓吸附法濃縮及回收氣化產氫製程中一氧化碳、二氧化碳與氫氣之模擬
★ 利用吸附程序於較小型發電廠煙道氣進氣量下捕獲二氧化碳之模擬★ 利用週期性吸附反應程序製造高純度氫氣並捕獲二氧化碳之模擬
★ 變溫吸附程序分離煙道氣中二氧化碳之連續性探討與實驗設計分析★ 利用PEI/SBA-15於變溫及真空變溫吸附捕獲煙道氣中二氧化碳之模擬
★ PEI/SBA-15固態吸附劑對二氧化碳吸附之實驗研究★ 以變壓吸附法分離汙染空氣中氧化亞氮之模擬
★ 以變壓吸附法分離汙染空氣中氧化亞氮之實驗★ 以變壓吸附法濃縮己二酸工廠尾氣中氧化亞氮之模擬
★ 利用變壓吸附法捕獲煙道氣與合成氣中二氧化碳之實驗★ 變壓吸附法回收發電廠廢氣與合成氣中二氧化碳之模擬
★ 利用變壓吸附程序分離甲醇裂解產氣中氫氣及一氧化碳之模擬★ 變壓吸附程序捕獲合成氣中二氧化碳之實驗研究與吸附劑之選擇評估
檔案 [Endnote RIS 格式]    [Bibtex 格式]    [相關文章]   [文章引用]   [完整記錄]   [館藏目錄]   [檢視]  [下載]
  1. 本電子論文使用權限為同意立即開放。
  2. 已達開放權限電子全文僅授權使用者為學術研究之目的,進行個人非營利性質之檢索、閱讀、列印。
  3. 請遵守中華民國著作權法之相關規定,切勿任意重製、散佈、改作、轉貼、播送,以免觸法。

摘要(中) 第一個研究目的在於簡易的製作出抗反射薄膜,利用電漿處理有機高分子,使其表面變得粗糙不平整,達到與繁複的半導體製程所製作出的抗反射層透膜與太陽電池抗反射表面有著相同的效果,期望可以應用在太陽電池或顯示器表面的抗反射膜,取代傳統的半導體製程抗反射層,且因表面能的緣故,可有效阻隔水氣對太陽電池的侵入,防止電池壽命減短。
第二部分在於利用奈米孔洞二氧化矽本身的孔洞缺陷,因為量子侷限效應(quantum confinement effect)的關係,而增加且增強二氧化矽的發光效率,其發光波長坐落在可見光波段,改變其孔隙率來變更發光的波段,最後在二氧化矽薄膜上利用半導體製程製作二維光子晶體,減少螢光的散射損失,使螢光能依循單一方向行進,使其能再增加發光強度,期望能有與LED有著相同的發光效果。
摘要(英) The first subject is to fabricate the anti-reflective films easily. We use Ar plasma exposure to modify BA-m benzoxazine surface, the surface profile will be roughen, and the films will exhibit the anti-reflective properties. Compare to the traditional semiconductor fabrication, the process is much simpler, and . And the surface energy of BA-m polybenzoxazine film is low enough, the contact angle of water excess 90˚. In other words, the film have hydrophobic property.
The second subject is to investigate the photoluminescence of mesoporous silica(MS), because of the quantum confinement effect, the nano pores in MS film can increase its luminescence efficiency. We fabricate 2D photonic crystal on silicon substrate, and then spin MS on the photonic crystal structures. The photonic crystal can confine the luminescence of mesoporous silica, to reduce the light scattering.
關鍵字(中) ★ 光子晶體
★ 二氧化矽
★ 介孔材料
★ 光致螢光
★ 橢圓儀
★ 抗反射
關鍵字(英) ★ silica
★ mesoporous
★ photoluminescence
★ ellipsometry
★ antireflective
★ photonic crystal
論文目次 摘要 I
Abstract II
誌謝 III
目錄 IV
圖目錄 VI
表目錄 IX
第一章 序論 1
1-1 抗反射層簡介 1
1-2 光子晶體簡介 1
1-3 論文架構 2
第二章 文獻回顧 4
2-1 表面結構對抗反射的影響 4
2-2 以矽為基礎(silicon based)的材料其光致螢光效應 7
2-3 光子晶體介紹 10
第三章 奈米表面結構之抗反射層製作 14
3-1 研究動機與方向 14
3-2 實驗藥品 14
3-3 實驗設備 15
3-4 實驗流程圖 16
3-5 實驗步驟 17
第四章 抗反射薄膜結果分析與討論 21
4-1 薄膜測厚儀(n&k Analyzer)的量測分析 21
4-2 薄膜反射率的分析 21
4-3 薄膜表面結構的分析 24
4-4 BA-m benzoxazine不同濃度下反射率的比較 26
4-5 BA-m polybenzoxazine的超疏水特性 28
第五章 發光性奈米孔洞二氧化矽薄膜的製作與應用 43
5-1 研究動機與方向 43
5-2 實驗藥品 44
5-3 實驗設備 45
5-4 實驗流程圖 48
5-5 實驗步驟 48
第六章 發光性奈米孔洞二氧化矽薄膜結果與討論 51
6-1 奈米孔洞二氧化矽膠體溶液的特性探討 51
6-2 奈米孔洞二氧化矽薄膜之成膜狀況探討 53
6-3 奈米孔洞的形成與結構排列探討 53
6-4 奈米孔洞的成分分析 55
6-5 奈米孔洞二氧化矽薄膜厚度&折射率&孔隙率分析 57
6-6 奈米孔洞二氧化矽的光致發光效應 70
第七章 總結 97
7-1 抗反射層結論 97
7-2 奈米孔洞二氧化矽發光效應結論 97
參考文獻 99
參考文獻 [1]E. Yablonovitch, Phys. Rev. Lett., 58 2059, 1987, “Inhibited Spontaneous Emission in Solid-State Physics and Electronics”
[2]S. John, Phys. Rev. Lett., 58 2486, 1987, “Strong localization of photons in certain disordered dielectric superlattices”
[3]Xin-Tong Zhang, Osamu Sato, Minori Taguchi, Yasuaki Einaga, Taketoshi Murakami and Akira Fujishima, Chem. Mater., 17, 696-700, 2005, “Self-Cleaning Particle Coating with Antireflection Properties”
[4]Stefan Walheim, Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Science, Vol.283, 1999, “Nanophase-separated polymer films as high-performance antireflection coatings”
[5]T. Baak, Appl. Opt., 21, 1069, 1982, “Silicon oxynitride ; a material for GRIN optics”
[6]Yongjin Wang, Xinli Cheng, Zhilang Lin, Changsheng Zhang and Feng Zhang, Vacuum, 72, 345-349, 2004, “Optimization of PECVD silicon oxynitride films for antreflection coating”
[7]許永龍, 以微結構光學薄膜增進太陽能電池量子效率之研究, 中華大學電機系碩士論文, 2006
[8]L. T. Canham, Appl. Phys. Lett., 57, 1046, 1990, “Visible light emission due to quantum size effects in highly porous crystalline silicon”
[9]K. H. Jung, S. Shih, T. Y. Hsieh, D. L. Kwong and T. L. Lin, Appl. Phys. Lett., 59, 3264, 1991, “Photoluminescence in Si/ZnO nanocomposites”
[10]Iwayama T. S., Fujita K., Nakao S., et al., J. Appl. Phys., 75(12) : 7779, 1994, ”Visible photoluminescence in Si+ implanted silica glass”
[11]L. Pavesi, L.D. Negro, C. Mazzoleni, G. Franzo, J.P. Prolo, Nature, 408, 440, 2000, “Optical gain in silicon nanocrystals”
[12]S. Hayashi, K. Yamamoto, J. Lumin., 70, 352, 1996, “Optical properties of Si-rich SiO2 films in relation with embedded Si mesoscopic particles“
[13]M. Xu, S. Xu, Y.C. Ee, Clare Yong, J. W. Chai, S.Y. Huang, J.D. Long, Materials Science and Engineering B, 128, 89~92, 2006, “Visible photoluminescence from the annealed TEOS SiO2”
[14]Yuryo Sakurai, Kaya Nagasawa, Journal of non-crystalline solid, 291, 86-92, 2001, “A study of the PL emission mechanisms in silica glass by considering the growth of the PL”
[15]H. Yang, A. Kuperman, N. Coombs, S. Mamiche-Afara, G. A. Ozin, Nature, 379, 703, 1996, “Synthesis of oriented films of mesoporous silica on mica”
[16]D. Zhao, Q. Huo, J. Feng. B. F. Chmelka, and G. D. Stucky, J. Am. Chem. Soc., 120, 6024, 1998, “Nonionic Triblock and Star Diblock Copolymer and Oligomeric Surfactant Syntheses of Highly Ordered, Hydrothermally Stable, Mesoporous Silica Structures”
[17]D. Zhao, P. Yang, N. Melosh, J. Feng, B. F. Chmelka, G. D. Stucky, Adv. Mater., 10, 1380, 1998, “Continuous Mesoporous Silica Films with Highly Ordered Large Pore Structures”
[18]Lin Xue-jing, Shen Jun, Xie Zhi-yong, Yao Lan-fang, Wu Xiao-xian, Luo Ai-yun, The Chinese Journal of Process Engineering, Vol.7, No.1, 2007, “Preparation and Properties of Ordered Mesoporous Silica Film”
[19]Chia-min Yang, An-thung Cho, Fu-ming Pan, Tzeng-guang Tsai and Kuei-jung Chao, Adv. Mater., 13, No.14, 2001, “Mesoporous Silica Films with Ultralow k and Ordered Pore Structures”
[20]Yu. D. Glinka, S. H. Lin, L. P. Hwang, and Y. T. Chen, Appl. Phys. Lett., Vol.77, No.24, 2000, “Photoluminescence from mesoporous silica : Similarity of properties to porous silicon”
[21]Omer Dag, Geoffrey A. Ozin, Hong Yang, Christian Reber, and Guillaume Bussiere, Adv. Mater., 11, No.6, 1999, “Photoluminescent Silicon Clusters in Oriented Hexagonal Mesoporous Silica Film”
[22]Yuri D. Glinka, Sheng-Hsien Lin, Lian-Pin Hwang, and Yit-Tsong Chen, J. Phys. Chem. B, 104, 8652-8663, 2000, “Photoluminescence Spectroscopy of Silica-Based Mesoporous Materials”
[23]Jia-Min Shieh, An-Thung Cho, Yi-Fan Lai, Bau-Tong Dai, Fu-Ming Pan and Kuei-Jung Chao, Electrochemical and Solid-State Letters, 7 (12) G319-G322, 2004, “Stable blue luminescence from mesoporous silica films”
[24]An-Thung Cho, Jia-Min Shieh, Jiann Shieh, Yi-Fan Lai, Bau-Tong Dai, Fu-Ming Pan, Hao-Chung Kuo, Yong-Chang Lin, Kuei-Jung Chao, and Pang-Hung Liu, Electrochemical and Solid-State Letters, 8 (6) G143-G146, 2005, “Emission of Bright Blue Light from Mesoporous Silica with Dense Si (Ge) Nanocrystals”
[25]卓恩宗、蔡增光、吳柏偉、潘扶民楊家銘、趙桂蓉, 奈米通訊, 第九卷第三期, 2002, “規則性奈米孔洞超低介電常數二氧化矽薄膜之製備”
[26]C. Jeffery Brinker, Lu Y. F., Seiiinger A., et al. Adv. Mater., 11, 579~586, 1999, “Evaporation-Induced Self-Assembly, Nanostructures Made Easy”
[27]Munekuni S., Yamanaka T., Shimogaichi Y., et al. J. Appl. Phys., 68 (3), 1212, 1990, “Various types of nonbridging oxygen hole center in high-purity silica glass”
[28]D. P. Yu, Q. L. Hang, Y. Ding H. Z. Zhang, et al. Appl. Phys. Lett. 73, 3076, 1998, “Amorphous silica nanowires : Intensive blue light emitters”
[29]卓恩宗、謝嘉民、謝健、賴一凡、林永昌、郭浩中、戴寶通等人, 規則性排列奈米孔洞二氧化矽薄膜應用在光致發光材料的研究與探討, 奈米通訊, 第11卷第1期, 2004
[30]E. Yablonovitch and T. J. Gmitter, Phys. Rev. Lett., 63, 1950~1953, 1989, “Photonic band structure: The face-centered-cubic case employing nonspherical atoms”
[31]王志逢, 新穎低表面能高分子研究及其在奈米壓印系統與超疏水表面之應用和學理探討, 交通大學應用化學所博士論文, 2006 [32]D. M. Roy and R. Roy, AM. Mineralogist, 40, 147, 1955, “Synthesis and stability of minerals in the system MgO-Al, O, -SiO, -H, O”
[33]陳慧英, 化工技術, 無機薄膜之製備與應用專輯, 11月號, 第80期, “溶膠凝膠法在薄膜製備上的應用”
[34]C. Jeffery Brinker, George W. Scherer, Acdemic Press, 108, 1990, “Sol-gel science: the physics and chemistry of sol-gel processing”
[35]S. V. Nitta, V. Pisupatti, A. Jain, P. C. Wayner, Jr., W. N. Gill, and J. L. Plawsky, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol.17, Issue 1, 205-212, 1999, “Surface modified spin-on xerogel films as interlayer dielectrics”
[36]S. Baskaran, J. Liu, K. Domansky, N. Kohler, X. Li, C. Coyle, G. E. Fryxell, S. Thevuthasan, R. E. Williford, Adv. Mater. 12, 291, 2000, “Low Dielectric Constant Mesoporous Silica Films Through Molecularly Templated Synthesis”
[37]Li-Lan Yang, Yi-Sheng Lai, and J.S. Chen, P.H. Tsai, C. L. Chen, and C. Jason Chang, J. Mater. Res., Vol.20, No.11, 2005, “Compositional tailored sol-gel SiO2-TiO2 thin films: Crystallization, chemical bonding configuration, and optical properties”
[38]S. Terada, T. Kinashi, and J. Spear, AIP Conf. Proc., 683, 546, 2003, “Pore Size Distribution Measurement of Porous Low-k Dielectrics Using TR-SAXS”
[39]J. Ilavsky, A. J. Allen, G. G. Long, and P. R. Jemian, Rev. Sci. Instrum. 73, 1660, 2002, “Effective pinhole-collimated ultrasmall-angle x-ray scattering instrument for measuring anisotropic microstructures”
[40]D. W. Gidley, W. E. Frieze, T. L. Dull, J. Sun, A. F. Yee, C. V. Nguyen, and D. Y. Yoon, Appl. Phys. Lett., 76, 1282, 2000, “Determination of pore-size distribution in low-dielectric thin films”
[41]K. Maex, M. R. Baklanov, D. Shamiyan, F. Iacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys. 93, 8793, 2003, “Low dielectric constant materials for microelectronics”
[42]A. A. Herrero, R. L. Heredero, E. Bernabeu, and D. Levy, Appl. Opt., 40, 527, 2001, “Adsorption of Water on Porous Vycor Glass Studied by Ellipsometry”
[43]M. R. Baklanov, K. P. Mogilnikov, V. G. Polovinkin, and F. N. Dultsev, J. Vac. Sci. Technol. B, 18, 1385, 2000, “Determination of pore size distribution in thin films by ellipsometric porosimetry”
[44]M. T. Othman, J. A. Lubguban, A. A. Lubguban, and S. Gangopadhyay, R. D. Miller, W. Volksen, and H. C. Kim, J. Appl. Phys., 99, 083503, 2006, “Characterization of porous low-k films using variable angle spectroscopic ellipsometry”
[45]H. G. Tompkins and W. A. McGahan, Spectroscopic Ellipsometery and Reflectometry : A User’s Guide, Wiley, New York, 1999
[46]R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, North-Holland, Amsterdam, 1987
[47]J. G. Webster, Wiley Encyclopedia of Electrical and Electronics Engineering Supplement, Vol.1, Wiley, New York, 2000
[48]李正中, 薄膜光學與鍍膜技術4th ed., 2004
[49]L. Ward, “The optical constants of bulk materials and films, 2nd”, 1994
[50]R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light, North-Holland, Amsterdam, 1977
[51]SOPRA, WinElli II reference manual
[52]M. Born and E. Wolf, Principles of Optics : Electromagnetic Theory of Propagation, Interference and Diffraction of Light, 7th ed., Cambridge University Press, Cambridge, 1999
[53]F. L. Pedrotti and L. S. Pedrotti, Introduction to Optics, 2nd ed., Prentice-Hall, Englewood Cliffs, NJ, 1993
[54]范萬達, 光學漸變層之製作與光學微影應用, 國研科技, 第六期, 2005
[55]n&k Technology, Inc., n&k Analyzer 1500 user’s guide, 2006
[56]賴宜生, 超薄氮氧化矽作為五氧化二鉭閘極氧化層之中介層特性研究, 成功大學材料科學及工程學系博士論文, 2003
[57]A. H. Carim and R. Sinclair, J. Electrochem. Soc., 134, 741, 1987, “The Evolution of Si/SiO2 Interface Roughness”
[58]G. E. Jellison, Jr., J. Appl. Phys., 69, 7627, 1991, “Examination of thin SiO2 films on Si using spectroscopic polarization modulation ellipsometry”
[59]Y. J. Cho, Y. W. Lee, H. M. Cho, I. W. Lee and S. Y. Kim, J. Appl. Phys., 85, 1114, 1999, “Ellipsometric examination of optical property of the Si–SiO2 interface using the s-wave antireflection”
[60]J. A. Lubguban et al., J. Mater. Res. 19, 3224, 2004, “Supercritical CO2 extraction of porogen phase : An alternative route to nanoporous dielectrics”
[61]D. E. Aspnes, Thin Solid Films, 89, 249, 1982, “Optical properties of thin films”
[62]Maxwell-Garnett JC., Philos trans R. Soc., (London), 205, 237~288, 1906, “Colors in metal glasses and in metallic films”
[63]Bruggeman D A G., Ann. Phys. (Leipzig), 24, 636~699, 1935, “Calculations of various physical constants of heterogeneous substance : part I, dielectric constants and conductivity of isotropic substance”
[64]Zhenyu Yang, Daqing Zhu, Dongs Heng Lu, Ming Zhao, Naning, Yong Jun Liu, Optical and Quantum Electronics 35 : 1133~1141, 2003, “Study of the relationship between porous ratio and effective index in nanoporous film”
[65]D. A. Barrow, T. E. Petroff, R. P. Tandon, M. Sayer, J. Appl. Phys., 81 (2), 15, 1997, “Characterization of thick lead zirconate titanate films fabricated using a new sol gel based process”
[66]Zhenyu Yang, Daqing Zhu, Ming Zhao and Mingcui Cao, Journal of Optics A : Pure And Applied Optics 6, 564~568, 2004, “The study of a nano-porous optical film with the finite difference time domain method”
[67]Yao Lanfang, Shen Jun, Wu Guangming, Ni Xingyuan, Wang Jue, Zhou Bin, Proc. of SPIE, Vol.5774, 2004, “Preparation of low-density porous silica thin films by ambient pressure drying”
[68]洪聖宗, 電子束微影鄰近效應修正與BA-m Benzoxazine film製備抗反射層, 中央大學化材所碩士論文, 2006
[69]Wang Fang, Yuan Jie, Zhang Qianling, Chen Jingzhong, Liu Jianhong, 2005年全國高分子學術論文報告會(China), The dynamic laser scattering study on the hydrolytic polycondensation of tetraethylorthosilicate(TEOS)
[70]Dong-Ho Kim, Chi-O Cho, Yeong-Geun Roh, Heonsu Jeon, and Yoon Soo Park, Applied Physics Letters, 87, 203508, 2005, “Enhanced light extraction from GaN-based light-emitting diodes with holographically generated two-dimensional photonic crystal patterns”
[71]Yong-Jae Lee, Se-Heon Kim, Joon Huh, Guk-Hyun Kim, Yong-Hee Lee, Sang-Hwan Cho, Yoon-Chang Kim, and Young Rag Do, Appl. Phys. Lett., Vol.82, No.21, 2003, “A high-extraction-efficiency nanopatterned organic light-emitting diode”
[72]M. Boroditsky, T. F. Krauss, R. Coccioli, R. Vrijen, R. Bhat, and E. Yablonovitch, Applied Physics Letters, Vol.75, No.8, 1999, “Light extraction from optically pumped light-emitting diode by thin-slab photonic crystals”
[73]折田賢児, Photonic Crystal Technology -Scenario of Industrialization-, Chapter 6, 2005, “Photonic Crystal Blue LEDs”
[74]Kee-Sun Sohn, Namsoo Shin, Yoon-Chang Kim, Young Rag Do, Applied Physics Letters, Vol.85, No.1, 2004, “Effect of corrugated substrates on light extraction efficiency and the mechanism of growth in pulsed laser deposited Y2O3:Eu3+ thin-film phosphors”
[75]羅光旭, 太陽能電池技術現況與展望, 經濟部能委會
[76]欒丕綱, 陳啟昌, 光子晶體:從蝴蝶翅膀到奈米光子學, 2005
指導教授 林俊宏、周正堂
(Chun-Hung Lin、Cheng-tung Chou)
審核日期 2007-7-23
推文 facebook   plurk   twitter   funp   google   live   udn   HD   myshare   reddit   netvibes   friend   youpush   delicious   baidu   
網路書籤 Google bookmarks   del.icio.us   hemidemi   myshare   

若有論文相關問題,請聯絡國立中央大學圖書館推廣服務組 TEL:(03)422-7151轉57407,或E-mail聯絡  - 隱私權政策聲明