| 摘要(英) |
This thesis is to provide a design technology that can be applied to the optical system
design for the projection-type exposure machine, in which the shape of exposure mask is a long
strip. It can be used for the scanning exposure of the photo-resist board with a large scan area.
The projection magnification of the exposure mask can be fine-tuned to compensate for the
thermal expansion of the substrate under light exposing.
There are three different ways to be used for the preliminary design, They are described as
the following, Type1: using the parameters from the related patent; Type2: system parameters
being calculated by the aberration formula from journal articles; Type3: system parameters
being calculated by the theory of paraxial optics.
By comparing the simulated results of the three design methods, it is found that the optical
specification such as the effective focal length, aberrations, and the ability of projection
magnification fine-tuning were very close among them. Thus, it justified the applicability of the
design method proposed in this thesis. In the case of not considering manufacturing tolerance,
and with MTF≧0.6 as the standard, the minimum line width of our design was about 7μm. In
addition, the range of projection magnification fine-tuning was up to 0.1%, the distortion
<0.001%, and the uniformity of exposing energy was greater than 90%.
Finally, the tolerance analysis of this design was conducted under the following
preconditions: the yield value being more than 90% (MTF≧0.6), the range of perturbations for
the Monte Carlo analysis being 3 times the standard deviation, and the minimum line width was
10μm. The basis of our tolerance analysis was the international ISO10110 standard. The
research of this thesis was focusing on the process of designing techniques. Although the
tolerances in this study were more stringent as compared to the ISO10110, the proposed design
technology was still a valuable choice for the optical system of the projection-type exposure
machine. |
| 參考文獻 |
[1] 電子回路世界大?（2012 年10 月） “Predominance of Projection Exposure System to
Contact Exposure System for the Manufacture of Printed Wired Board ”; Masato
Sumiya USHIO Inc,Yokohama.JP.
[2] 高啟清, “HDI Image Transfer Technology and Trend ”, 課程講義
[3] “VLSI 製造技術”, 莊達人編著, 高立圖書有限公司出版
[4] 國際半導體技術藍圖(International Technolody Roadmap for
Semiconductors;ITRS),2010
[5] “半導體製造技術”, ch13,滄海書局出版
[6] 志聖工業，Flip Chip 高階投影式曝光機，“FPE-A107L Stepper”，產品規格型錄
[7] Duk Lee,“Optical projection system”, U.S. Patent, Patent NO. 7006197, Dec. 2, 2004.
[8] 發明名稱:“投影曝光裝置”,公告號：I249082,發明人: 末永豊 SUENAGA,
YUTAKA ,申請人:牛尾電機公司 公告日:2007/07/02。
[9] 趙凱華，鍾錫華，光學，初版，儒林圖書有限公司，台北，民國86 年4 月。
[10] 陳奇夆，“工程光學上課講義”。
[11] 孫慶成，光電概論，二版，全華科技圖書有限公司，台北，民國91 年3 月。
[12] 張弘，幾何光學，初版，東華書局，台北，民國76 年。
[13] 孫文信，幾何光學，取自教學講義。
[14] 王國權，「變焦光學系統之設計與分析」，國立台北科技大學光電技術所，碩士論文，
民國92 年。
[15] 發明名稱:“投影光學系統” ,公告號：I249082,發明人:大村泰弘 OMURA,
YASUHIRO ,申請人:NIKON CO.,LTD.日本,公告日:2007/07/02。
[16] Chris A. Mack, ’’ Development of Positive Photoresists”, J. Electrochem. Soc. 1987,
Volume 134, Issue 1, Pages 148-152.
[17] Jinyun Zhou *, Liang Lei, Qinghua Lin, and Wenyan Pei,“Optics Optimization of 10μ
m Resolution Used for the Smart Phone’s PCB and ITO Lithography”, International
Conference on System Science, Engineering Design and Manufacturing
Informatization,2011;
[18] Frank L. Pedrotti, ”Introduction to Optrics”, pp.464-466, Pearson International
Edition,2009.
[19] C.K.Tau, “Design of zoom system by the varifocal different equation I”, Applied
Optics,1992
[20] 訊技科技, “ZEMAX 光學設計程式使用手冊” , 2003.
[21] Smith, Warren J., ”Modern Optical Engineering: The Design of Optical Systems”,
McGraw-Hill 2007.
[22] 李介仁，”輕薄短小的DLP 變焦投影鏡頭之設計探討”, 國立中央大學, 碩士論文,民國九十一年五月
[23] Stephens, R. E.（1948）. The design of triplet anastigmat lenses, JOSA, 38:1032.
[24] Rudolf Kingslake,R.Barry Johnson, “Lens design fundamentals” , Academic Press, Nov
20, 2009
[25] C. G. Wynne.“Two-Mirror Anastigmats”, Journal of the Optical Society of America
vol.59, number5, May 1969.
[26] M. Herzberger ,“Replacing a Thin Lens by a Thick Lens,”Journal of the Optical
Society of America, Vol.34, number2 Feb. 1944
[27] 葉茂勳，”變焦鏡頭高斯光學之設計”, 國立中央大學, 碩士論文,民國七十五年
[28] Antonin Miks,“Modification of the formulas for third-order aberration
coeffients,”Journal of the Optical Society of America,Vol.19,No.9,pp.1867-1871,
September 2002.
[29] 蘇朝墩，產品穩健設計，二版，中華民國品質學會，台北，民國91 年3 月。
[30] 張輝煌，實驗設計與變異數分析，增訂版，建興出版社，台北，民國89 年2 月。
[31] 范光照、張郭益，精密量測，三版，高立圖書有限公司，台北，民國91 年7 月。
[32] 范光照、張郭益，精密量具與機件檢驗，三版，高立圖書有限公司，台北，民國87
年3 月。 |
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