X 光 波 域 光 學 薄 膜 之 研 究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：59

、訪客IP：3.15.211.107

姓名

鄭光珮(Kung-Pei Cheng) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

X 光波域光學薄膜之研究
(The Research of Optical Thin Filmin the X-Ray Region)

相關論文

★ 半導體雷射控制頻率	★ 比較全反射受挫法與反射式干涉光譜法在生物感測上之應用
★ 193nm深紫外光學薄膜之研究	★ 超晶格結構之硬膜研究
★ 交錯傾斜微結構薄膜在深紫外光區之研究	★ 膜堆光學導納量測儀
★ 紅外光學薄膜之研究	★ 成對表面電漿波生物感知器應用在去氧核糖核酸及微型核糖核酸雜交反應檢測
★ 成對表面電漿波生物感測器之研究及其在生醫上的應用	★ 探討硫化鎘緩衝層之離子擴散處理對CIGS薄膜元件效率影響
★ 以反應性射頻磁控濺鍍搭配HMDSO電漿聚合鍍製氧化矽摻碳薄膜阻障層之研究	★ 掃描式白光干涉儀應用在量測薄膜之光學常數
★ 量子點窄帶濾光片	★ 以量測反射係術探測光學薄膜之特性
★ 嵌入式繼光鏡顯微超頻譜影像系統應用在口腔癌切片及活體之設計及研究	★ 軟性電子阻水氣膜之有機層組成研究

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

[檢視]

[下載]

本電子論文使用權限為同意立即開放。
已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。

摘要(中)

本論文研究軟X光區域的多層膜高反射鏡及使用銅靶輻射量測X光反射率，檢測多層膜結構。
關於13.6nm的近垂直入射多層膜高反射鏡，可優化出高反射率的膜層結構。經優化53層鉬矽多層膜，鉬和矽的膜層厚度分別為3.03nm和4.07nm，對S偏振光而言，四分之一波膜堆的理想反射率為69.42%，我們優化後週期性膜堆的理想反射率為72.12%。對p偏振光而言，四分之一波膜堆的理想反射率為65.97%，我們優化後週期性膜堆的理想反射率為69.36%。
由於近垂直入射多層膜高反射鏡對膜厚及粗糙度的要求甚高，因此使用離子束濺鍍法製鍍出非晶態薄膜，藉著銅靶輻射以掠角入射薄膜，根據Kiessig干涉條紋精準的求得薄膜的特性，包括薄膜密度、消光係數、厚度及各界面粗糙度。求得的結果與原子力顯微鏡比較，並非完全吻合。主要的原因為X光量測的範圍較大，因此提供的訊息是平均值，且包含高頻波。而原子力顯微鏡量測的範圍是局部性，且濾掉高頻波。

摘要(英)

The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity .
For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high–reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% .
It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves.

關鍵字(中)

★ X 光
★ 光學薄膜
★ 粗糙度

關鍵字(英)

★ Optical Thin Film
★ X-ray

論文目次

目錄
致謝辭 I
中文摘要 II
英文摘要 III
目錄 IV
圖目錄 VI
表目錄 IX
符號表 X
第一章前言 1
1-1 X光發現及其特性 1
1-2 研究動機 4
1-3 文獻回顧 7
1-4 論文概要 9
第二章理論 10
2-1 折射率 10
2-2 X光反射率 15
2-2-1 一個平整介面的X光反射率 15
2-2-2 多個界面的X光反射率 17
2-3 多層膜高反射鏡之理論 19
2-3-1 適當波長及適當材料的選擇 19
2-3-2 優化膜層厚度 26
2-4 簡形優化法 30
第三章實驗儀器 33
3-1 掠角入射X光反射率分析多層膜結構 33
3-1-1 實驗裝置 33
3-1-2 實驗校準 34
3-2 離子束濺鍍(Ion Beam Sputtering Deposition) 36
3-2-1 離子束濺鍍鍍膜系統架構 37
3-3 原子力顯微鏡 39
第四章實驗與模擬結果 40
4-1 軟X光多層膜高反射鏡的光譜圖模擬 40
4-2 X光反射率解析多層膜結構 44
4-2-1 模擬結果 44
4-2-2 實驗結果 53
第五章結論 68
第六章參考文獻 69

參考文獻

[1] 國家毫微米元件實驗室,積體電路製程技術訓練班(II),pp.6.1-6.78
[2] Takeshi Namioka, “Overview of Japanese multilayer research”, SPIE 984, pp.124, 1988
[3] R. C. Catura, E. G. Joki, T. E. Whittemore, W. J. Brookover, “Recent results in multilayer research”, SPIE 984, pp.214, 1988
[4] 李正中, 薄膜光學與鍍膜技術, 藝軒出版社, 1999
[5] E. Spiller, “Low-loss reflection coatings using absorbing materials”, Appl. Phys. Lett., 20(9), pp.365, 1972
[6] Masaki Yamamoto, Takeshi Namioka, “Layer-by-layer design method for soft-x-ray multilayer”, Appl. Opt., 31(10), pp.1622, 1992
[7] E. Spiller, Armin Segmuller, “Cotrolled fabrication of multilayer soft-x-ray mirrors”, Appl. Phys. Lett., 37(11), pp.1048, 1980
[8] 王占山, “極紫外與軟X射線非週期多層膜優化設計及初步研制”, 光學儀器, 25(5-6), pp.138, 2001
[9] Alan G. Michette, Zhanshan Wang, “Optimisation of depth-graded multilayer coatings for broadband reflectivity in the soft X-ray and EUV regions”, Optics Communications, 177, pp.47, 2000
[10] V.V. Protopopov, V.A. Kalnov, “X-ray multilayer mirrors with an extended angular range”, Optics Communications, 158, pp.127, 1998
[11] E. Spiller, in Physics, Fabrication, and Applications of Multilayered Structures, edited by P. Dhez and C. Weisbuch(Plenum, New York), pp.284, 1988
[12] Muamer Zukic, Jongmin Kim, Michele Wilson, Jungho Park, Douglas G. Torr, “Non-grazing high reflective narrowband multilayer x-ray coatings”, SPIE 2011, pp.323, 1993
[13] Paul B. Mirkarimi, Sasa Bajt, Mark A. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography”, Appl. Opt., 39(10), pp.1617, 2000
[14] Troy W. Barbee, Jr., Stanley Mrowka, Michael C. Hettrick, “Molybdenum-silicon multilayer mirrors for extreme ultraviolet”, Appl. Opt., 24, pp.883, 1985
[15] Claude Montcalm, Brain T. Sullivan, Henri Pepin, J. A. Dobrowolski, M. Sutton, “Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering”, Appl. Opt., 33(10), 2057, 1994
[16] A. Ivan, R. Bruni, K. Byun, F. Christensen, P. Gorenstein, S. Romaine, ”Design and optimization of multilayer coatings for hard x-ray mirrors”, SPIE 3773, pp.107, 1999
[17] M. Arbaoui, R. Barchewitz, C. Sella, K.B. Youn, ”Absolute reflectivity measurements at 44.79 of sputter deposited multilayer x-ray mirrors”, Appl. Opt., 29(4), pp.477, 1990
[18] A. V. Tikhonravov, M. K. Trubetskov, V. V. Protopopov, A. V. Voronov, “Application of the needle optimization technique to the design of X-ray mirrors”, SPIE 3738, pp.248, 1999
[19] I. V. Kozhevnikov et al., Nucl. Instrum. and Meth. A 345, pp.594-603, 1994
[20] Benjawan SaeLao, Optics Letters 26( 7) , 2001
[21] T. Salditt et al , Phys. Rev. B 54, pp.5860, 1996
[22] Ken Skulina, Applied Optics 34, pp.3727 , 1995
[23] H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 , pp.1873-1882, 1998
[24] L.G. Parratt, C.F. Hempstead, “Anomalous dispersion and scattering of X-ray”, Phys. Rev., 94, pp.1593, 1954
[25] Martin Huppauff, Klaus Bange, Bruno Lengeler, “Density ,thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by X-ray reflection”, Thin solid film, 230, pp.191-198, 1993
[26]許樹恩, 吳泰伯, X光繞射原理與材料結構分析, 中國材料科學學會, pp.138, 1993
[27] E. Spiller, Soft X-Ray Optics, SPIE, pp.145, 1994
[28] Brian L. Evans and Barry J. Kent, “Soft X-ray platinum-carbon multiplayer mirrors”, Appl. Opt., 26, pp.4491, 1987
[29] 1.Masahito NIIBE, Shigetaro OGURA, Masami TSUKAMOTO, Takashi IIZUKA, Akira MIYAKE, Yutaka WATANABE, Yasuaki FUKUDA, “Normal Incidence Multilayer Mirrors for Soft X-Rays”, The Review of Laser Engineering, Vol.24, No.1, 1996, pp.48-60
[30] 光學常數來自http://www-cxro.lbl.gov/optical_constants/
[31] 鄭天水、金慶原、邢中菁、王之江,”用於軟X光反射鏡Ni/C、Mo/Si多層膜的機制”, 真空科學與技術, No.10(4), 1990, pp.269-274
[32] 呂俊霞、曹健林,”8.0nm附近Mo/B4C軟X射線多層膜初步研究”, 光學精密工程, No.4(5), 1996, pp.36-39

指導教授

李正中(Cheng-Chung Lee)

審核日期

2002-7-1

推文