脈衝直流濺鍍法製作參雜氮之二氧化鈦

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姓名

黃建豪(Chien-Hao Huang) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

脈衝直流濺鍍法製作參雜氮之二氧化鈦
(The research of nitrogen doped titanium dioxide fabricated by pulsed DC magnetron sputtering)

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摘要(中)

本研究分成兩部分，第一部分是利用脈衝直流磁控濺鍍系統成長二氧化鈦薄膜( TiO2)，藉以了解二氧化鈦的基本特性。製程參數為調變基板不同製程溫度、氬氣流量、氧氣流量的變化，並利用接觸角量測儀、X光繞射儀及電子顯微鏡，親水性、薄膜結晶與表面型態。
實驗結果顯示，溫度對樣品親水性影響顯著。且膜面狀態深受氬氣、氧氣流量的影響；氬氣流量越多且氧氣流量適當的選擇之下，可得較佳的TiO2光觸媒薄膜表面形態與親水性效果。
第二部份為二氧化鈦參雜氮氣製作之研究，目的為使其工作波長能移至可見光波段，實驗以第一部分的遲滯曲線為基礎，計算參雜比例分別為0%、20%、40%、60%、80%。並利用光譜儀、接觸角量測儀、X光繞射儀及電子顯微鏡與原子力顯微鏡，分析光學能隙、親水性、薄膜結晶與表面型態。
實驗結果顯示，氧氣流量對樣品親水性都與光分解顯著。且在本研究中，因為粗糙度在0.4~2.062 nm之間，故推測粗糙度對親水性無直接影響；氮氣參雜過多的情況下，量測XRD顯示anatase晶相強度有變小的情況，而氧氣流量過少的情況下，卻會得到氧化不足，偏金屬狀態，得到的光觸媒效果皆非理想，但在過渡模態與金屬模態間可得較佳的TiO2光觸媒薄膜親水性效果。

摘要(英)

This research is separated into two parts. In the first part, the main purpose of this research is titanium dioxide thin film deposited on glass substrate with pulsed DC reactive sputterring system. The various parameters include three different parts: heating temperature, argon and oxygen flow. The films were characterized by spectrophotometer, contact angle, X-ray diffraction and scanning electron microscope.
The result shows that temperature is important to hydrophilicity. Also, thin film surface profile is strongly influenced by argon flow and oxygen flow. More argon flow and adequate oxygen flow can lead to better surface profile and hydrophilicity.
In the second part, the main purpose of this part is titanium dioxide thin film doped with nitrogen and shifted the working wavelength to visible light. Experimental parameter based on hysteresis curve in the first part. The films were characterized by spectrophotometer, contact angle, X-ray diffraction, scanning electron microscope and atomic force microscope. The photo-induced degeneration test is irradiated with 365nm UV light and visible light examined with absorption spectrum.
The result shows that oxygen flow is important to both photodegeneration and hydrophilicity. The roughness of thin film is between 0.4~2.062 nm, and it seems to no influence upon this research. The anatase phase becomes weaker with overflowed nitrogen. Besides, less oxygen flow leads to metal like thin film. Therefore, it would be better hydrophilicity to choose oxygen flow between transition mode and oxygen mode.

關鍵字(中)

★ 二氧化鈦
★ 脈衝直流磁控濺鍍
★ 光觸媒

關鍵字(英)

★ photocatalyst
★ TiO2
★ pulsed DC magnetron sputtering

論文目次

摘要 I
Abstract III
目錄 IV
表目錄 VI
圖目錄 VII
第一章　緒論 1
1-1前言 1
1-2研究動機 3
第二章原理與製程簡介 4
2-1理論背景 4
2-2光觸媒介紹 8
2-3添加異質原子對二氧化鈦薄膜性質的改變 11
2-4一般製備方法介紹 13
2-5製程比較 26
第三章實驗內容 28
3-1研究內容簡介 28
3-2研究步驟 28
3-3試樣選擇 29
3-4實驗設備及測量裝置 29
第四章實驗結果與討論 37
4-1二氧化鈦薄膜之性質 37
4-1-1氧氣流量與靶材電壓之關係 37
4-1-2製程溫度與工作氣體流量對親水性的影響 39
4-1-3工作氣體流量對膜結構的影響 45
4-2參雜氮氣之二氧化鈦薄膜 50
4-2-1接觸角及分解效果 51
4-2-3膜面結構與XRD分析 59
4-2-4光學能隙 67
第五章結論 72
5-1研究結論 72
5-2未來工作 72
參考文獻 74

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指導教授

李正中(Cheng-Chung Lee)

審核日期

2007-7-18

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