應用表面微結構沉積銀顆粒輔助製作矽奈米線之研究

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姓名

鍾政毅(Cung-Yi Cheng) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

應用表面微結構沉積銀顆粒輔助製作矽奈米線之研究
(Study of assist fabricating Silicon nano wire by depositing silver particle on surface microstructure)

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摘要(中)

矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體矽基奈米結構具有許多優異的性質，廣泛應用半導體、光電、生醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其醫及能源領域中，因此發展製程技術扮演著關鍵的角色而其矽奈米線製備有許多的方法，奈米線製備有許多的方法，奈米線製備有許多的方法，奈米線製備有許多的方法，奈米線製備有許多的方法，其中最常製備成奈米線製備成奈米線製備成奈米線是使用氫氟酸與硝是使用氫氟酸與硝是使用氫氟酸與硝是使用氫氟酸與硝酸銀直接製作出奈米顆粒酸銀直接製作出奈米顆粒酸銀直接製作出奈米顆粒酸銀直接製作出奈米顆粒，再利用金屬輔助蝕刻出再利用金屬輔助蝕刻出再利用金屬輔助蝕刻出矽奈米線。本實驗為了探討為了探討利用氫氧化鉀氫氧化鉀做表面處理做表面處理做表面處理後，預先形成不同尺寸形成不同尺寸形成不同尺寸的金字塔的金字塔微結構，再使用硝酸銀使用硝酸銀、硼氫化鈉與硼氫化鈉與檸檬酸鈉產生出奈米銀顆粒沉積檸檬酸鈉產生出奈米銀顆粒沉積檸檬酸鈉產生出奈米銀顆粒沉積檸檬酸鈉產生出奈米銀顆粒沉積檸檬酸鈉產生出奈米銀顆粒沉積在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些在經過表面處理之後的矽，再利用這些沉積的沉積的銀金屬顆粒輔助化金屬顆粒輔助化金屬顆粒輔助化金屬顆粒輔助化學蝕刻出陣列奈米線，奈米線，奈米線，奈米線，藉由電子顯微鏡觀察矽表面的奈米結構形貌藉由電子顯微鏡觀察矽表面的奈米結構形貌藉由電子顯微鏡觀察矽表面的奈米結構形貌藉由電子顯微鏡觀察矽表面的奈米結構形貌藉由電子顯微鏡觀察矽表面的奈米結構形貌藉由電子顯微鏡觀察矽表面的奈米結構形貌及影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由影像分析等性質討論。經一系列實驗的發現，矽表面由氫氧化鉀氫氧化鉀蝕刻過後的表面可刻過後的表面可沉積較多的銀顆粒，而另合成較多的銀顆粒，而另合成較多的銀顆粒，而另合成較多的銀顆粒，而另合成較多的銀顆粒，而另合成較多的銀顆粒，而另合成粒徑會因為溫度的不同而有所的不同而有所的不同而有所，而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密而藉由奈米銀顆粒的變化可得到更細小及緻密奈米線。

摘要(英)

In recent years, silicon nanostructure has received great deal of attention from its unique surface effects. The use of silicon nanostructure has been applied to a wide variety of fields including semiconductor, optoelectronic, biological and energy field. Therefore, the fabrication technique developing silicon nanostructure becomes an intriguing topic for researchers. Preparation of silicon nanostructure has many ways. In the past, the common silicon nanostructure was prepared by using hydrofluoric acid and silver nitrate produce nano-silver particles for metal-assist chemical etching. In this experiment, we explore the use of sodium hydroxide surface treatment for silver particles formation. Next, silver nitrate, sodium tetrahydridoborate and sodium citrate produced nano silver particles, which are deposited on the surface-treated silica after reuse the nano silver particles assist chemical etching nanowires. Though electron morphology and properties of nano structure silicon surface image analysis we designed a series of experiments, firstly the silicon surface by potassium hydroxide etching can be deposited more the silver particles. Secondly synthesis of silver particles in solution at different temperatures because particle sizes vary in different temperatures. With the change of nano-silver particles, we can obtain finer and dense nanowire.

關鍵字(中)

★ 金屬輔助化學蝕刻
★ 矽奈米線
★ 金字塔微結構

關鍵字(英)

★ MACE
★ silicon nano wire
★ pyramid microstructure

論文目次

摘要 i
Abstract ii
誌謝 iii
目錄 iv
圖目錄 vi
表目錄 viii
第一章緒論 1
1.1前言 1
1.2研究動機與目的 2
第二章原理與文獻回顧 3
2.1 矽奈米線陣列的製備 3
2.2 濕式化學蝕刻 4
2.2.1 非等向性濕式蝕刻之理論 6
2.2.2 非等向性濕式蝕刻的反應機制與影響因素 10
2.3 金屬輔助化學蝕刻（Metal Assisted Chemical Etching, MACE） 12
2.3.1簡介和原理 12
2.3.2矽奈米結構形成的影響 13
2.4奈米粒子合成原理 17
2.4.1奈米粒子製備方法 18
2.4.2還原奈米銀粒子 19
第三章實驗原理與實驗步驟 20
3.1實驗材料與藥品 20
3.2 實驗器材 21
3.3 實驗分析儀器 22
3.4 實驗流程 22
3.4.1利用KOH蝕刻矽晶圓表面 23
3.4.2製備奈米銀顆粒 23
3.4.2製備奈米線 23
3.5 分析儀器介紹 24
3.5.1電子顯微鏡 24
第四章結果與討論 28
4.1 不同溫度與KOH蝕刻形成微結構尺寸之變化 28
4.2 不同溫度下奈米銀顆粒的合成 39
4.3經KOH表面處理後銀顆粒的沉積 47
4.4銀顆粒輔助化學蝕刻製作矽奈米線 50
第五章結論 59
第六章參考資料 60

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指導教授

李天錫(Tien-Hsi Lee)

審核日期

2016-6-17

推文