基於受抑式全反射原理之光學式混濁度量測系統

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姓名

黃薪源(Hsin-Yuan Huang) 查詢紙本館藏

畢業系所

光機電工程研究所

論文名稱

基於受抑式全反射原理之光學式混濁度量測系統
(Turbidity Monitoring of Electrical Discharge Machining by Frustrated Total Internal Reflection)

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摘要(中)

本研究目的是開發一種光學式混濁度量測系統。為了使放電加工機台得到更良好的加工品質，因應環境因素的變動，控制器必須能即時調整製程參數。放電加工液體混濁度是放電加工過程中的一項重要參數，藉由監測放電加工油的混濁度，利用量測系統所量測到的混濁度，判斷是否要改變放電加工油的噴流速度，減少積碳與加工屑停留在加工面上，使加工環境保持在最佳加工濃度，藉此提高放電加工(EDM)的加工精度和壽命。

摘要(英)

The purpose of this study is to develop an optical turbidity measured system. The concentration of EDM neutral oil is an important parameter in the EDM. According to measuring the turbidity of EDM neutral oil changing the velocity of jet flow and we can reduce the carbon deposition to stay on the processing surface, so that the processing environment to maintain the best processing concentration. To improve the machining precision and life of EDM.

關鍵字(中)

★ 臨界角
★ 受抑式全反射
★ 混濁度量測

關鍵字(英)

★ Critical Angle
★ Frustrated Total Internal Reflection
★ Turbidity Measurement

論文目次

摘要 I
Abstract II
誌謝 III
目錄 IV
圖目錄 VII
表目錄 X
第一章緒論 1
1-1 研究背景 1
1-2 文獻回顧 2
1-2-1 朗伯-比爾定律 2
1-2-2 散射定律 3
1-2-3 混濁度概述 4
1-3 研究動機、目的與方法 13
1-4 論文架構 14
第二章基礎理論 15
2-1 惠更斯原理 15
2-3 反射定律與司乃耳 18
2-4 受抑式全反射原理 19
2-5 阿貝折射計 20
2-6 混濁度與反射率關係之物理模型建立 22
2-7 小結 26
第三章系統架構 27
3-1 光源系統選擇 27
3-1-1雷射與白光比較 27
3-1-2光源瓦數與靈敏度間的影響 29
3-2 光學元件 32
3-3 訊號擷取與分析系統 32
3-4 抽水幫浦 35
3-5 感測器機構設計 35
3-6 受抑式全反射混濁度量測系統 41
3-7 元件及儀器介紹 43
3-8 小結 45
第四章實驗結果與討論 46
4-1 可行性實驗及模擬 46
4-2 實驗準備 52
4-2-1 製作受抑式全反射感測器 52
4-2-2 光源系統入射角的設定 53
4-2-3 循環系統組裝 54
4-2-4 整合系統 54
4-3 即時量測實驗 58
4-3-1 階梯式通入放電加工液體量測實驗 58
4-3-2 放電加工即時量測 60
4-3-3 量測穩定度實驗 61
4-3-4 量測解析度 61
4-4 反射率對應濃度 62
4-5 誤差分析 63
4-5-1 臨界角誤差 63
4-5-2 濃度誤差 64
4-6 小結 65
第五章結論與未來展望 66
5-1 結論 66
5-2 未來展望 66
參考文獻 68

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指導教授

李朱育(Ju-Yi Lee)

審核日期

2018-1-12

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