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姓名 徐子杰(Zi-Jie Xu) 查詢紙本館藏 畢業系所 光電科學與工程學系 論文名稱 低應力類鑽碳膜應用於熱成像系統之抗反射膜
(Low-stress Diamond-Like Carbon film applied to anti-reflection film of thermal imaging system)相關論文 檔案 [Endnote RIS 格式]
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至系統瀏覽論文 (2025-6-30以後開放)
摘要(中) 類鑽碳膜有著高機械硬度、強抗腐蝕能力以及在紅外光譜下低吸收，可作為熱成像儀鏡頭的抗反射膜層及保護層，但因為殘留應力過大，導致類鑽碳膜在薄膜厚度調整上受到了限制，因此利用高密度電漿來改善此缺點。本實驗使用射頻負偏壓微波電漿輔助化學氣相沉積系統沉積類鑽碳膜，藉由螺旋微波獨立控制電漿密度的大小，來調整試片表面的離子通量，並透過射頻負偏壓控制離子撞擊試片的能量。
本實驗使用甲烷作為反應氣體，在固定氣體流量下，探討以不同的射頻負偏壓、微波功率以及薄膜厚度對類鑽碳膜的影響，利用拉曼光譜儀與光電子能譜儀分析薄膜的結構組成，以及利用奈米壓痕儀與Fizeau干涉儀量測薄膜的機械性質，並以傅立葉轉換紅外光譜儀分析類鑽碳膜的光學性質。
藉由射頻功率增加負偏壓的方式，類鑽碳膜的硬度可以從350 W射頻功率的7.92 GPa上升至500 W的12.7 GPa，提升60%。在射頻功率450 W下，以800 W的微波功率進行90分鐘鍍製而得的類鑽碳膜，能夠通過MIL-F-48616規範且外觀與性能不受到影響，其3~5 μm波段的紅外光穿透率可達71.18 %，硬度達到5.27 GPa。摘要(英) The diamond-like carbon film has high mechanical strength, strong corrosion resistance, and low absorption rate in the infrared spectrum. It can be used as an anti-reflection film and protective layer for thermal imager lenses. However, since excessive residual stress limits the thickness of the diamond-like carbon film, high-density plasma is used to improve this shortcoming. This experiment uses a microwave plasma-assisted chemical vapor deposition system with negative radio-frequency bias to deposit diamond-like carbon films. The plasma density is independently controlled by the Helicon wave to adjust the ion flux on the sample surface, and the ion energy that bombards the sample is controlled by the negative radio-frequency bias.
In this experiment, methane was used as the reaction gas. The influence of different negative radio-frequency bias, microwave power and film thickness on the diamond-like carbon film under a fixed air flow is discussed. The structure of the film was analyzed by Raman spectrometer and photoelectron spectrometer, the mechanical properties of the film were measured by nanoindenter and Fizeau interferometer, and the optical properties of diamond-like carbon film were analyzed by Fourier transform infrared spectroscopy.
Increasing the negative bias voltage by radio-frequency power can increase the hardness of the diamond-like carbon film from 7.92 GPa at 350 W radio-frequency power to 12.7 GPa at 500 W, an increase of 60%. Under 450 W radio-frequency power, 800 W microwave power was used to coat the diamond-like carbon film for 90 minutes. It can pass MIL-F-48616 specifications without affecting appearance and performance. The infrared transmittance in the 3~5μm band can reach 71.18%, and the hardness can reach 5.27 GPa.關鍵字(中) ★ 類鑽碳膜
★ 抗反射膜關鍵字(英) ★ Diamond-Like Carbon film
★ anti-reflection film論文目次 摘要 i
ABSTRACT ii
致謝 iv
目錄 v
圖目錄 vii
表目錄 ix
第一章 緒論 1
1-1 前言 1
1-2 研究動機與目的 3
第二章 基礎理論 4
2-1 類鑽碳膜的結構與分類 4
2-2 類鑽碳膜的成長機制 8
2-3 電漿輔助化學氣相沉積法 11
2-4 電容耦合式電漿輔助化學氣相沉積法 13
2-5 微波電漿輔助化學氣相沉積法 16
第三章 實驗方法與量測儀器 18
3-1 射頻負偏壓微波電漿輔助化學氣相沉積系統 18
3-2 實驗材料 21
3-3 實驗流程與步驟 22
3-4 量測儀器 24
拉曼光譜儀 24
光電子能譜儀 26
奈米壓痕儀 28
傅立葉轉換紅外光譜儀 30
干涉儀 31
第四章 結果與討論 32
4-1 射頻負偏壓對類鑽碳膜的影響 32
4-2 微波功率對類鑽碳膜的影響 35
4-3 薄膜厚度對類鑽碳膜的影響 40
第五章 結論 47
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