超透鏡與突破繞射極限之研究

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姓名

劉俊宏(Chun-Hung Liu) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

超透鏡與突破繞射極限之研究
(The research of superlens and breaking diffraction limit)

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摘要(中)

基於光的波動特性，一般光學系統之空間解析度受繞射極限的影響而無法辨析大小小於波長的二分之一的物體，此乃因為帶有細節訊號的高空間頻率訊號為指數衰減的倏逝波，所以於本文中探討的超透鏡則可以突破繞射極限，來達到次波長成像。
本文分兩部分，分別為介電質∕金屬膜層堆疊的三層超透鏡和多層超透鏡，並利用數值模擬軟體COMSOL Multiphysics做電磁模擬並對此進行分析，在三層超透鏡本文去比較不同膜層厚度對次波長成像之影響；而多層超透鏡，本文分別探討其不同介電質∕金屬之組合、不同膜層厚度和不同對數的影響下對其影響。經由模擬後可得三層超透鏡ZnO(20 nm)∕Ag(30 nm)∕ZnO(20 nm)在光波長365 nm，解析度可以突破繞射極限達到80 nm，而多層超透鏡Ag(12 nm)/(Ta2O5(8 nm)/Ag(12 nm))*3之解析度能夠突破繞射極限達到40 nm。

摘要(英)

Based on the characteristic of waves of light, the spatial resolution in a general optical system is limited by the diffraction limit and it cannot distinguish objects whose size is less than one-half the wavelength. This is because the evanescent waves, which are high spatial frequency signals which carry the detailed signals, exponentially decay. The superlens which discussed in this thesis can break the diffraction limit to achieve sub-wavelength imaging.
This thesis is divided into two parts. It is a three layer superlens and multilayer superlens which are layered metal-dielectric systems. The numerical simulation software COMSOL Multiphysics will be used for electromagnetic simulation. In the part of three layer superlens, we adjust the film thickness and compare the effect in sub-wavelength imaging. And in the part of multilayer superlens, we discuss the effect of different combinations and different pairs between dielectric and metal, and different film thicknesses. After simulation,we adopted a three layer superlens ZnO(20 nm)/Ag(30 nm)/ZnO (20 nm) in sub-wavelength imaging at wavelength of 365 nm , and it can break the diffraction limit down to 80 nm, and the resolution of multilayer superlens Ag(12 nm)/(Ta2O5(8 nm)/Ag(12 nm))*3 which can break the diffraction limit reach to 40 nm.

關鍵字(中)

★ 繞射極限
★ 超穎材料
★ 表面電漿
★ 雙曲材料

關鍵字(英)

★ diffraction limit
★ metamaterials
★ surface plasmon
★ hyperbolic metamaterials

論文目次

摘要 i
ABSTRACT ii
誌謝 iii
總目錄 iv
圖目錄 vii
表目錄 ix
第一章緒論 1
1-1 前言 1
第二章基礎理論 5
2-1 電磁理論 5
2-1-1 電磁波方程式 5
2-1-2 電磁場之邊界條件 6
2-2 表面電漿簡介 6
2-2-1 金屬的光學特性 6
2-2-2 表面電漿 8
2-2-3 介電質∕金屬介面之表面電漿模態 9
2-2-4 有限厚度薄板之表面電漿模態 13
2-3 近場光學 17
2-3-1 解析度 17
2-3-2 倏逝波 19
2-4 超透鏡 21
2-4-1 三層之超透鏡 21
2-4-2 多層之超透鏡 23
第三章數值模擬 28
3-1 介質膜層電磁傳播之模型 28
3-2 三層之超透鏡 28
3-2-1 三層之超透鏡之參數選擇 28
3-2-2 三層之超透鏡之模擬分析 30
3-2 多層之超透鏡 34
3-2-1 多層之超透鏡之參數選擇 34
3-2-2 多層之超透鏡之模擬分析 37
第四章結論與未來展望 46
4-1 結論 46
4-2 未來展望 47
參考文獻 48

參考文獻

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指導教授

李正中(Cheng-Chung Lee)

審核日期

2020-8-22

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