頭戴式顯示裝置波前檢測

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姓名

卓玉婷(Yu Ting Cho) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

頭戴式顯示裝置波前檢測
(Use Wavefront Sensor to Evaluate the Head Mount Display)

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★ 高數值孔徑顯微物鏡設計	★ Double Zernike Polynomial 校準光學系統
★ 薄型化光展量疊加太陽能集光器	★ A Similarity-Guided Spots Sorting Method to Increase the Dynamic Range of a Shack Hartmann Sensor
★ 雷射微型投影機波前量測技術	★ 旋轉掃描式非球面干涉儀之演算法開發及應用
★ 校準低敏型Shack-Hartmann波前感測器	★ 利用Slanted-edge方法以及相位回復演算法量測光學系統的成像像差

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至系統瀏覽論文 (2025-9-6以後開放)

摘要(中)

Meta 執行長Mark Elliot Zuckerberg 於2021年的Facebook Connect 會議上強調元宇宙(Metaverse)是下一個前線，並說出「從現在開始，我們將以元宇宙為優先，而不是Facebook」，預告未來發展主力將放在自家的頭戴式裝置Oculus上。與此同時，數位晶片相關公司的股票隨之大漲，有許多人都期待元宇宙實際生成的那天。
頭戴式裝置是元宇宙不可或缺的存在，使用者在戴上裝置後，便會有身臨其境的「沉浸式」體驗。但這類裝置有極大的致命缺點，在長時間使用後會有超越普通3C裝置的疲憊感，甚至會有頭暈、頭痛、噁心、想吐等症狀。此類裝置的發展超過20年，但VAC(Vergence Accommodation)仍然沒有一個客觀的評估標準。
本篇論文提出一種全新的頭戴式裝置評估系統，主要使用本實驗室開發的高動態範圍 Shack-Hartmann 波前檢測器，利用客製化超大邊長23mm正方形微透鏡陣列(MLA)以及大片幅波前檢測器進行量測工具，待測物使用中強光電提供之混合實鏡(MR)裝置，透過在上面顯示直徑為20 Pixel之白點，並利用程式控制改變光場位置以完成不同視場的量測。最後使用入射光角度回推成像位置，並取得光源的光強、像差等各種資訊。
量測系統為初步架構，未來仍有許多的改善空間，在科技進步下，能擁有更多不同的待測物，產生更多可參考數據，以期對頭戴式裝置建立一客觀且通用的評估標準。

摘要(英)

Meta CEO Mark Elliot Zuckerberg emphasized at the Facebook Connect conference in 2021 that the Metaverse is the next frontier, and said that "from now on, we will prioritize the Metaverse, not Facebook,", the main force of future development will be on headset “Oculus”. At the same time, stocks of digital chip-related companies have soared, and people are looking forward to the day when the Metaverse actually takes shape.
Head-mounted devices are an indispensable existence in the Metaverse. After wearing the device, users will have an "immersive" experience. However, the device has a huge fatal disadvantage. After long-term use, it will feel more tired than ordinary 3C devices, and even have symptoms such as dizziness, headache, nausea, and vomiting. Such devices have been developed for more than 20 years, but there is still no objective evaluation criterion.
This paper proposes a new head-mounted device evaluation system, which mainly uses the high dynamic range Shack-Hartmann wavefront detector developed in our laboratory, and uses a customized super large 23mm square microlens array (MLA) and large format the wavefront detector is used as a measurement tool. The object to be measured uses the mixed Reality (MR) device provided by the medium-intensity photoelectricity. By displaying a white spot with a diameter of 20 pixels on it, and using program control to change the position of the light field to complete different views. Field measurement. Finally, use the angle of incident light to push back the imaging position, and obtain various information such as light intensity and aberration of the light source.
The measurement system is a preliminary structure, and there is still a lot of room for improvement in the future. With the advancement of science and technology, it can have more different objects to be measured, and generate more reference data, in order to establish an objective and general evaluation of head-mounted devices.

關鍵字(中)

★ 波前檢測
★ 頭戴式裝置

關鍵字(英)

★ Wavefront Sensor
★ Head Mount Display

論文目次

摘要 II
ABSTRACT IV
致謝 VI
目錄 VII
圖目錄 X
表目錄 XIII
一、緒論 1
1-1 研究背景 1
1-2 文獻回顧 2
1-3 研究動機 3
二、研究內容及方法 9
2-1 光學理論 9
2-1-1 SEIDEL 像差多項式 9
2-1-2 ZERNIKE像差多項式 11
2-1-3 球差(SPHERICAL) 13
2-1-4 畸變(DISTORTION) 14
2-2 SHACK – HARTMANN波前檢測器 15
2-2-1 量測原理 15
2-2-2 點指派(SPOT ASSIGNMENT)演算法 17
2-2-3 光點質心(CENTROID)計算法 19
2-2-4 高動態範圍SHACK – HARTMANN波前檢測器 20
2-2-5 點光源位置量測 22
三、實驗方法 24
3-1 SHACK–HARTMANN波前檢測器硬體架構 24
3-2 MR裝置 26
3-3 頭戴式裝置評估系統實驗架構 29
3-4 光學系統校正 31
3-5 FULL FIELD波前掃描 34
3-6 光源背光問題 35
3-7 光強度(INTENSITY)單位校正 38
3-7-1 灰階值(GRAYSCALE)單位介紹 38
3-7-2 PHOTOMETRY CALIBRATION 39
3-8 FULL WAVEFRONT DATA FROM HDR WFS MEASUREMENT 43
3-9 PUPIL SHIFTING 46
四、實驗分析 50
4-1 FULL FIELD 光源入射角分析 50
4-2 FULL FIELD LOCAL CURVATURE分析 52
4-3 LUMINANCE分析 55
4-3-1 X軸上LUMINANCE 55
4-3-2 FULL FIELD LUMINANCE 57
4-4 FULL FIELD ZERNIKE像差分析 58
4-4-1 ZERNIKE像差波前重建 58
4-4-2 ZERNIKE像差PEAK TO VALLEY 60
五、結論 61
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指導教授

梁肇文(Chao Wen Liang)

審核日期

2022-9-14

推文