| 摘要(英) |
This paper aims to establish a model that can quickly simulate a rotary UV-LED parallel exposure machines, using the relative motion between the light source and the target plane to achieve the average effect, and applying the degradation model to each light source, comparing before and after Finally, design exposure machine models under different specifications to improve the degradation problem.
Today′s parallel exposure machines that use UV-LED as the light source mainly form an array of light sources, but the initial radiant flux of each light source is not necessarily the same, and the UV-LED chip and light source components will be assembled. There are various errors such as linear offset, angular offset, etc., which lead to correction after assembly, and the uniformity of the exposure machine needs to be quite high compared to other products. The market generally takes the uniformity≧90% as the target . However, when the exposure machine is used for a long time, the degradation rate of each UV-LED is different, that is, when the light sources are lit at the same time, the radiation flux of each light source may not be the same after a period of time. The degradation problem caused by use.
In this research, white LEDs were used instead of UV-LEDs for follow-up simulations, mainly because UV spectrum is harmful to the human body, and it is more convenient and safe to actually verify if there is a plan in the future. Because the light source used in this research will change over time, it would take a lot of time to use optical tracking software. Therefore, the illuminance distribution of the light source is first fitted with a mathematical function, and then the fitted function is corrected to change its position over time. function to simulate the effect of light source rotation.
The design of the exposure machine model is first analyzed for different areas, divided into rotation center area, non-boundary affected area and rotation boundary area, through the analysis to find out the problems in each area, and give appropriate solutions, so that later more efficient design.
Because exposure machines are non-consumer products, most of them are customized products according to different needs, so there is not only a single specification in design, so this research uses three different light source spacings under different conditions, using the aforementioned for different Based on the analysis results of the area, design exposure machine models of different specifications as a reference, and add the established degradation model, analyze the exposure machine models of different specifications, the improvement effect on the light degradation, and the subsequent correction method for the degradation.
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| 參考文獻 |
[1] Jan Burck, Thea Uhlich, Christoph Bals, Niklas Höhne, Leonardo Nascimento, Monica Tavares and Elisabeth Strietzel(Monday, November 14th, 2022).Climate Change Performance Index 2023. Retrieved from https://ccpi.org/download/climate-change-performance-index-2023/
[2] 2021全球PCB億元俱樂部 台資營收領先、陸資家數居冠。台灣電路板協會。檢自https://www.tpca.org.tw/Message/MessageView?id=11648&mid=283
[3] 黃煥彰(2021)。台灣印刷電路板業的社會責任――產業技術升級、事業廢棄物處理技術也應升級。看守台灣。檢自https://www.taiwanwatch.org.tw/node/1400
[4] 陳奇夆、孫皓格(2017)。旋轉式曝光機。中華民國專利號I575333。經濟部智慧財產局。
[5] 陳奇夆(2016)。掃描式UV-LED曝光裝置。中華民國專利號I529500。經濟部智慧財產局。
[6] 沙滕堡 馬克 Ｌ、 亨德爾 魯道夫 Ｈ、卡卡希 麥可(2016)。 透過旋轉、平移及可變的處理條件之暴露劑量均勻化。中華民國專利號I598935。經濟部智慧財產局
[7] Jiajie Fana, Zhou Jingc, Yixing Caoa, Mesfin Seid Ibrahimf, Min Li, Xuejun Fang,Guoqi Zhang(2021).Prognostics of radiation power degradation lifetime for ultraviolet light-emitting diodes using stochastic data-driven models. Energy and AI. Volume 4. https://doi.org/10.1016/j.egyai.2021.100066.
[8] Ayşe Kızılersü, Markus Kreer, Anthony W. Thomas(2018).The Weibull distribution Significance Volume 15, Issue 2. https://doi.org/10.1111/j.1740-9713.2018.01123.x
[9] S.A.Prahl, M.Keijzer,S.L.Jacques,A.J.Welch,”A Monte Carlo Model of Light Propagation in Tissue”, SPIE Institute Series Vol. IS 5,pp.102-111,1989.
[10] MathWorks。檢字https://www.mathworks.com/help/stats/weibull-distribution.html
[11] Cree® XLamp® XP-G LEDs, Product family data sheet, CLD-DS20 Rev 15C, http://www.cree.com/led-components/media/documents/XLampXPG.pdf
[12] 郭信宏(2016)。一種應用於類面光源陣列的光場演算技術之研究。國立中央大學。博士論文。
[13] 徐安永(2017)。一種應用於準直系統光源的光照度分布演算之研究。國立中央大學。碩士論文。
[14] 鍾奕晨，2019，「一種應用於UV-LED系統光源設計的光分布演算法之研究」，國立中央大學，碩士論文。
[15] C. M. Sparrow. 1916. “On spectroscopic resolving power”. The Astrophysical Journal, Vol. 44, pp. 76.
[16] I. Moreno, M. Avendaño-Alejo, & R. I. Tzonchev. 2006. “Designing light-emitting diode arrays for uniform near-field irradiance”. Applied optics, Vol. 45(10), pp. 2265-2272.
[17] I. Moreno, C. C. Sun, & R. Ivanov. 2009. “Far-field condition for light-emitting diode arrays”. Applied optics, Vol. 48(6), pp. 1190-1197.
[18] E. Hecht. 2002. Optics. 4th. International edition, Addison-Wesley, San Francisco, 3.
[19] Arvo, James (1992), "Fast random rotation matrices", in David Kirk (ed.), Graphics Gems III, San Diego: Academic Press Professional, pp. 117–120
[20] Woolard, Edgar (2012-12-02). Spherical Astronomy. ISBN 978-0-323-14912-9.
[21] 田登, 大. (2007). 色彩工程學: 理論與應用. 全華圖書股份有限公司.
[22] Griffiths, David J. Introduction to electrodynamics 3. ed., reprint. with corr. Upper Saddle River, NJ [u.a.]: Prentice-Hall. 1999 [2012-04-06]. ISBN 0-13-805326-X
[23] I. Moreno, P. X. Viveros-Méndez. (2021)"Modeling the irradiation pattern of LEDs at short distances," Opt. Express 29, 6845. https://doi.org/10.1364/OE.419428
[24] Jiajie Fan, Kam-Chuen Yung, Michael Pecht(2012).“Lifetime Estimation of High-Power White LED Using Degradation-Data-Driven Method”. IEEE Transactions on Device and Materials Reliability, Volume 12, Issue 2, pp. 470-477.
[25] F. Jose Arques-Orobon, Manuel Vazquez, Neftali Nuñez(2020) .“Lifetime Analysis of Commercial 3 W UV-A LED”. Crystals 2020, 10(12), 1083. https://doi.org/10.3390/cryst10121083
[26] Xiaoli Wang(2017).“LED ring array light source design and uniform illumination properties analysis”. Optik , Volume 140, July 2017, Pages 273-281. https://doi.org/10.1016/j.ijleo.2017.04.045
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