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以雷射直寫製作長週期光柵應用於 折射係數感測;Using laser direct writing to fabricate long period gratings for refraction index sensing
http://ir.lib.ncu.edu.tw/handle/987654321/93530
title: 以雷射直寫製作長週期光柵應用於 折射係數感測;Using laser direct writing to fabricate long period gratings for refraction index sensing abstract: 本論文利用鈉銀離子交換的技術製作光波導基板,然後利用雷射直寫技術製作長週期光柵,並藉由顯微系統研究光波導經過光柵的分光情形。在理論上模擬光波導在光柵中因為包層模式下所產生的折射行為,並指出包覆層折射係數對於折射光影響的重要性。在實驗上我們成功地看到光在經過光柵後所產生的顏色變化,然而我們不同週期的光柵之間的顏色變化沒有明顯的分別。我們將其歸因於光柵週期的區別不夠大。;This paper uses sodium-silver ion exchange technology to make optical waveguide substrates, and then uses laser direct writing technology to make long-period gratings, and uses a microscope system to study the light splitting of the optical waveguide after passing through the grating. Theoretically simulate the refractive behavior of the optical waveguide in the grating due to the cladding mode, and point out the importance of the refractive index of the cladding layer on the refracted light. Experimentally, we have successfully seen the color changes produced by light after passing through gratings. However, there is no obvious difference in the color changes between our gratings with different periods. We attribute this to the fact that the grating period is not sufficiently different.
<br>以人工智慧模型修復超穎透鏡影像品質之研究;Research of improving metalens image base on artificial intelligence model
http://ir.lib.ncu.edu.tw/handle/987654321/92437
title: 以人工智慧模型修復超穎透鏡影像品質之研究;Research of improving metalens image base on artificial intelligence model abstract: 在當今世界中,光學透鏡在我們的日常生活中佔據的很重要的地位,其廣泛的被運用在各種科技設備中,包括智慧型手機、自動駕駛傳感器和擴增實境(Augmented Reality, AR)及虛擬實境(Virtual Reality, VR)設備中,這些設備都有朝著更薄、更輕的消費電子產品的趨勢,創造了對光學元件不斷微型化的需求。然而,傳統的折射透鏡,如凸透鏡或凹透鏡材料,因為其體積龐大,嚴重阻礙了光學元件的微型化。而近年來,在次波長尺度上的奈米結構發展取得了顯著進展,對超穎表面的關注日益增加。這些奈米結構超穎表面利用集體共振來在奈米尺度上控制電磁波的特性,這一進展為創建微型光學元件展開了可能性。我們對超穎透鏡進行了光學特性的分析,並利用兩個連續的人工智能模型來解決超穎透鏡拍攝的影像中由於超穎透鏡的材料損耗和結構散射所導致的模糊與色偏問題。在人工智能模型這部分,我們分別使用自動編碼器和CodeFormer來校正色偏和重建影像細節。我們透過自動編碼器模型成功解決了所有面部影像的色偏,而CodeFormer模型則可以有效地重建了標準正面臉部、帶有臉部表情的面部細節和側面臉部影像,透過這樣的連續兩個人工智慧模型提升了超穎透鏡在日常生活的應用潛力。;In today’s world, optical lenses play a vital role in our daily lives and are widely used in various technological devices, including smartphones, self-driving sensors, and augmented reality (AR) / virtual reality (VR) equipment. These devices are trending towards thinner and lighter consumer electronics, creating a demand for the continuous miniaturization of optical components. However, traditional refractive lenses, such as convex or concave materials, are bulky and severely hinder the miniaturization of optical components.
In recent years, there has been significant progress in the development of nanostructures on sub-wavelength scales, leading to a growing interest in metasurfaces. These nanostructured metasurfaces utilize collective resonances to control the characteristics of electromagnetic waves at the nano-scale, opening up possibilities for the creation of miniature optical components.
We conducted an analysis of the optical properties of the metasurface lens and used two sequential AI models to address the blurriness and color cast issues in images captured by the metasurface lens due to material loss and structural scattering of the metasurface lens. In terms of AI models, we used an Autoencoder and CodeFormer to correct color cast and reconstruct image details, respectively. We successfully addressed color cast in all facial images using the Autoencoder model, while the CodeFormer model effectively reconstructed standard frontal faces, facial expressions, and side profile images. Through these two sequential AI models, we have increased the potential for the application of metasurface lenses in daily life.
<br>結合光譜反射和橢偏技術於奈米級薄膜特性量測之研究;Research on the Measurement of Nanoscale Thin Film Properties through the Integration of Spectral Reflectance and Ellipsometric Techniques
http://ir.lib.ncu.edu.tw/handle/987654321/92435
title: 結合光譜反射和橢偏技術於奈米級薄膜特性量測之研究;Research on the Measurement of Nanoscale Thin Film Properties through the Integration of Spectral Reflectance and Ellipsometric Techniques abstract: 本研究提出了一種新的方法,將橢偏技術和光譜反射量測結合,用於分析光學薄膜的特性,包括厚度和折射率。為了確保測量的準確性,在進行實際薄膜量測之前,先透過模擬方式做誤差分析,以了解可能的誤差來源及其對結果的影響。此做法有助於在實驗過程中迅速識別出潛在的問題,並採取修正措施,從而提高整體的準確度。
完成模擬分析後,進一步對分析結果預測各種參數的誤差閾值。例如,在預期的誤差範圍內,如厚度誤差小於2奈米和折射率誤差小於0.5%的情況下,則在實際薄膜量測中,偏振角和檢偏角的絕對值誤差需小於0.1度,而入射角的絕對值誤差需小於0.2度。這些誤差閾值確保了在實驗過程中所獲得的結果能夠在可接受的範圍內保持一定的準確性。
為了實現最佳的擬合效果,本研究使用了基因演算法,以找到在整個參數空間中的全域最佳解。此外,採用了RAE架構和四點量測法,以實現快速的系統量測和計算。這些選擇不僅加速了測量過程,還使操作變得更加簡便。
在實際的穩定性測試和標準片測試中,成功地驗證了系統的穩定性和準確性。隨著誤差的減少和程式的優化,將超薄膜與JA Woo的擬合結果相比,發現此系統所量測的厚度絕對誤差皆小於0.8奈米,而折射率的百分誤差也皆小於1%,再次呈現了系統穩定性與精確度。
總結而言,本研究所提出的方法和系統為分析光學薄膜的特性提供了一個強大的工具。通過結合橢偏技術和光譜反射量測,並在模擬分析的指導下,成功地實現了對數奈米級厚度的高精度量測。;This study proposes a novel approach that combines ellipsometry techniques with spectral reflection measurements to analyze the characteristics of optical thin films, including thickness and refractive index. To ensure measurement accuracy, error analysis is conducted through simulations before actual thin film measurements are performed. This practice aids in promptly identifying potential issues during the experimental process and taking corrective measures to enhance overall accuracy.
Following the simulation analysis, further prediction of error thresholds for various parameters is carried out. For instance, within the anticipated range of errors, such as thickness deviations below 2 nanometers and refractive index errors less than 0.5%, the absolute errors of polarizing angles and analyzer angles in actual thin film measurements need to be less than 0.1 degrees, while the absolute error of the incident angle should be less than 0.2 degrees. These error thresholds ensure that the results obtained during the experimental process maintain a certain level of accuracy within acceptable limits.
To achieve optimal fitting effects, this study employs a genetic algorithm to identify the global best solution within the entire parameter space. Additionally, the use of the RAE architecture and a four-point measurement method facilitates rapid system measurement and computation. These choices not only expedite the measurement process but also simplify operations.
Stability tests and standard sample assessments successfully validate the stability and accuracy of the system. With decreasing errors and program optimization, the measured thickness of ultra-thin films using this system exhibits absolute errors consistently below 0.8 nanometers, while the percentage error in refractive index remains below 1%, showcasing system stability and precision once again.
In summary, the method and system presented in this study provide a potent tool for analyzing the characteristics of optical thin films. By combining ellipsometry techniques with spectral reflection measurements and guided by simulation analysis, the research effectively achieves high-precision measurements of sub-nanometer-level thickness.
<br>利用電漿輔助原子層沉積鍍製抗反射膜於塑膠基板之環境測試;Environment Test of Anti-Reflection Coating on Plastic Substrate by Plasma Enhanced Atomic Layer Deposition
http://ir.lib.ncu.edu.tw/handle/987654321/92433
title: 利用電漿輔助原子層沉積鍍製抗反射膜於塑膠基板之環境測試;Environment Test of Anti-Reflection Coating on Plastic Substrate by Plasma Enhanced Atomic Layer Deposition abstract: 本論文使用電漿輔助原子層沉積技術鍍製抗反射膜於PMMA基板,在低溫製程70°C下前驅物使用TDMAT及3DMAS分別鍍製TiO2及SiO2,使用電漿模式通入氧氣混合氬氣做為氧化方式,在單層膜下探討折射率(n)及消光係數(k)之趨勢找出最佳製程參數與條件,塑膠基板本身是軟性基材,因此在鍍製多層膜中使用 150W 及 100W 容易造成基板表面受到離子轟擊影響產生損傷形成裂痕,因此實驗中 則選用 50W 做為鍍製抗反射膜之條件。透過量測儀器來分析其單層膜及多層膜之結構,X 光繞射儀器來 確認其 TiO2 薄膜結構之組成,隨著 ALD 循環次數(膜厚)提高其結晶 強度從 82 上升至 117,使用原子力顯微鏡來探討薄膜表面之粗糙度,其平均粗糙度約為0.28nm顯示出薄膜表面相當平坦,因此在 TiO2單層膜中處於微結晶狀態,多層膜使用高解析掃描穿透式電子顯微鏡觀察抗反射膜之結構來驗證與Macleod模擬軟體所設計的層數皆相符。利用奈米複合層在單層膜中插入抑制層能有效降低其結晶現象來降低薄膜之應力,透過恆溫恆濕機台在惡劣環境下觀察其薄膜變化及時間耐久性,環境測試條件設定在溫度 85°C及濕度85%,在未插入抑制層的抗反射膜能延長至998小時,有插入 4層1.5nm SiO2的抗反射膜僅能維持在209 小時,從結果表明 TiO2 隨著插入層數增加無明顯改善應力,反而TiO2隨厚度遞減使薄膜偏向不緻密性在高濕度下水氣容易侵蝕薄膜,在未插層中TiO2薄膜相對厚因此緻密性足夠因而有較低WVTR,對於整體抗反射膜能有較佳的耐久性。;In this study, plasma-assisted atomic layer deposition technology was employed to coat an anti-reflective film on a PMMA substrate. The precursors, TDMAT and 3DMAS, were used respectively for the deposition of TiO2 and SiO2 films at a low temperature of 70°C. The plasma mode introduces a mix of oxygen and argon for oxidation. The refractive index (n) and extinction coefficient (k) trends in the single-layer film were examined to determine optimal process parameters and conditions. Given that the plastic substrate is soft, using power settings of 150 watts and 100
watts for multi-layer coatings can lead to substrate surface damage and crack formation due to ion bombardment. As a result, a 50-watt setting was chosen for anti-reflection film deposition in these experiments. The structures of single and multi-layer films were analyzed using measurement instruments, with the composition of the TiO2 film structure confirmed via X-ray diffraction. As the number of ALD cycles (indicative of film thickness) increased, its crystallization strength rose from 82 to 117. Atomic force microscopy revealed a film surface roughness of approximately 0.28 nm, indicating a notably flat surface. Hence, the single layer TiO2 film exhibits a microcrystalline state. The multi-layer film structure, in contrast, was verified to match the layer count predicted by Macleod simulation software when examined using a transmission electron microscope. By incorporating an inhibition layer within the nano-composite layer of a single film, the crystallization phenomenon can be effectively reduced, subsequently lowering the stress on the film. The film′s changes and durability under harsh conditions were observed using a constant temperature and humidity machine, with test conditions set at 85°C and a
humidity of 85%. Anti-reflective films without the inhibition layer lasted up to 998 hours. In contrast, anti-reflective films with four inserted layers of 1.5nm SiO2 only persisted for 209 hours. The results show that the stress on the TiO2 does not show significant improvement with increasing insertion layers. Instead, the thickness of TiO2 decreases, causing the film to become less dense. In high humidity, the film is easily eroded by moisture. The relatively thicker TiO2 film in non-inserted layers is denser, resulting in a lower WVTR, thus providing better durability for the anti reflective film.
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