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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/1646


    Title: 微電鍍成長速度最佳化與影像監控
    Authors: 高培復;Pei-Fu Kao
    Contributors: 光機電工程研究所
    Keywords: 微電鍍;微電析;微陽極引導微電鍍;MAGE;3D micro-structure;micro-fabrication;micro-anode guided electroplating;localized electro-deposition
    Date: 2006-07-03
    Issue Date: 2009-09-21 09:56:59 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本論文主要目的有二個:1.藉由改善微電鍍系統的性能,在電鍍時間與電鍍品質之間找到一個平衡點。2.加裝影像系統,對微電鍍的生長情況做進一步的討論。為有效縮短電鍍析出物的時間本文提出了以振動陽極的方式,加速電鍍時離子的對流與擴散,而有效的縮短了電鍍的時間,並且在析出微柱的品質上找到一個平衡點,使得在快速析出下,又可以兼顧析出微柱的緻密性。 本文中將對系統的各硬體模組與軟體設計加以說明與介紹,並且針對我們所提出的方法以不同實驗、改變不同變因來討論。在影像系統方面使用連續擷圖與影像的錄製來討論微柱的生長情形。 There are two purposes in this paper. 1.We want to find a balance point between plating time and growth time through improvement of our MAGE control system. 2.We establish the digital imaging subsystem on our original MAGE control system, and use the digital imaging subsystem to observe the growth behavior of micro electroplating. In order to reduce the plating time, we have the new idea of vibrating our anode. Our new idea can speed up convection and diffuse of ion, and reduce the plating time effectively. Our new idea not only reduces the plating time also has good quality of the metallic micro column. In this article, we introduce the hardware and software module of MAGE control system. We have experiments to discuss our new idea. In digital imaging subsystem, we have continuous grabbing image and image recording to discuss the growth behavior of micro electroplating.
    Appears in Collections:[光機電工程研究所 ] 博碩士論文

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