本篇論文主要是針對鋁電解電容器用低壓陽極箔進行研究。選取不同製程參數條件之鋁箔，探討鋁箔經電化學蝕刻後表面積增加率之影響。 實驗首先利用酚來溶解低壓用陽極鋁箔。並且利用感應耦合電漿原子發射光譜儀及X光繞射法，分析不溶於酚溶液中的晶析出相，確定其元素及含量，以便後續之研究。其次設計不同製程參數，分別為不同均質化溫度、不同冷加工量之電蝕鋁箔研究。 在電化學蝕刻之後，再按照EIAJ的規範對電蝕箔做化成處理，並量測其靜電容量及重量損失率。利用光學顯微鏡及掃描式電子顯微鏡，來觀察電蝕箔之截面腐蝕形態及表面的腐蝕孔洞分佈情形。藉由這些分析方法，來比較不同製程參數所造成之腐蝕組織，對鋁電解電容器用低壓陽極箔之靜電容量的影響。 由實驗得知:實施低溫均質化處理的鋁箔，Fe元素析出量較多，造成腐蝕量較大，可得到較佳的腐蝕組織，因此靜電容量較高；而在實施不同冷加工量的鋁箔，靜電容量差異不大，但仍以高冷加工量稍微較佳。 The investigation is a research regarding to the anode foil of aluminum electrolytic capacitor. In this paper, the electrochemical behavior of high purity aluminum foils with the different parameter of the thermal treatment has been studied. First of all, the precipitations of chemical compositions in high purity aluminum foils were determined before etching by using the analysis of XRPD. Besides, ICP-AES could be used to measure the amount of precipitations by analyzing the dissolution of filter paper. This research will examine different parameter of procedure such as different homogenization treatment and cold rolling. After electrochemical etching, we forming according to EIAJ standard and measure its capacitance and rate of weight loss. To discuss the effect of capacitance caused by etched structure, the morphology of etched surface and cross section was observed by scanning electron microscope (SEM) and optical microscope (OM).From the observation of etched microstructure , the effect of procedure factors on the etching behavior of high purity aluminum foils could be studied in details. In the results of experiment, although the capacitance of aluminum foil is similar under different cold-rolled, but high cold-rolled was best. When the temperature of homogenization treatment was decreased, the precipitation Fe was raised. And then aluminum foil had fine pit which distributed uniform, so the capacitance will be increase.
