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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/2378


    Title: 奈米碳管元件之製作與分析;Fabrication and Characterization of Carbon Nanotube Device
    Authors: 鄭木棋;Mu-Chin Cheng
    Contributors: 機械工程研究所
    Keywords: 奈米碳管;場發射;內連線;Interconnect;Field emission;Carbon nanotube
    Date: 2004-06-25
    Issue Date: 2009-09-21 11:45:15 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 利用微波電漿化學氣相沉積(Microwave Plasma Chemical Vapor Deposition, MPCVD)以金屬Ni來當作觸媒在基板溫度400℃下,成長出圖案化多壁奈米碳管(Multiwall Carbon Nanotube, MWCNT)。 利用IC圖案化製程和MPCVD,在Vias結構中成長出直徑為20-40nm的多壁奈米碳管,來當作積體電路內連線中的材料。 以拉曼散射光譜(Raman Spectroscopy)和場發射量測儀器(Field Emission Measurement),來探討不同製程參數對於奈米碳管的場發射和石墨化性質影響。 Well-patterned multi-walled carbon nanotubes were grown by microwave plasma chemical vapor deposition with Ni as catalyst at 400℃. The resulting multi-walled carbon nanotubes with 20-40nm in diameter were used as interconnect material in vias by microwave plasma chemical vapor deposition and patterning process. Effects of growth parameters on the field emission and the graphitize of multi-walled carbon nanotube were analyzed by raman spectroscopy and field emission measurement.
    Appears in Collections:[機械工程研究所] 博碩士論文

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