English  |  正體中文  |  简体中文  |  Items with full text/Total items : 74010/74010 (100%)
Visitors : 24665996      Online Users : 494
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/2535

    Title: 鋁箔在不同電流波形交流電作用下之電蝕行為;Electrochemical Etch of Al-foil by AC-different wave
    Authors: 彭建勳;Chien-Hsun Pen
    Contributors: 機械工程研究所
    Keywords: 鋁箔;三角波;正弦波;方波;Aluminum foil;Triangle wave;Sinusoidal wave;Aquare wave
    Date: 2005-06-07
    Issue Date: 2009-09-21 11:49:39 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本研究乃探討:高純度鋁箔(99.98%),在外加不同電流波形的交流電(三角波、正弦波及方波)作用下之電蝕行為。採用傳統定電流循環極化法(Galvanodynamic Voltammetry Polarization;GVP)及本論文所提出的阻抗對時間的關係圖分析。鋁箔電蝕後的表面形貌利用掃瞄式電子顯微鏡(SEM)與穿透式電子顯微鏡(TEM)來觀察。 在外加不同電流波形的交流電時,鋁箔孔蝕形貌將呈現不同。三角波之孔蝕為立方蝕孔,此立方蝕孔為連續向下蝕刻;正弦波之孔蝕則呈現不規則形狀向下蝕刻;而方波之蝕孔為一特定方向的長條狀的蝕孔。蝕孔深度依次為三角波>正弦波>方波。 因電流波形特性差異,三角波電流上升緩慢因而使氧化膜結構較為緻密;而正弦波到達最大電流的時間較短,而使氧化膜結構較為鬆散;方波因瞬間電流達到正負最大值,因而鋁箔表面在未形成氧化膜前,便直接進行蝕刻,造成蝕孔表面形貌與三角波及正弦波有極大的差異。 The main propose of this research is to investigate the high purity aluminum foil(99.95%) hole-etching behaviors under different current wave forms which are triangle, sine, and square waves. Furthermore, the Galvanodynamic Voltammetry Polarization (GVP) and electroresist-to-time graphs are utilized for electrochemical analyses. By observing the hole etching profiles of aluminum foils with Field Emission Gun Scanning Electron Microscopy (FE-SEM), it shows that the etching surface profiles change with different current forms. The results shows; 1.Applying triangle wave, the etching profiles are cubic and continuous down the foil surfaces. 2. Applying sine wave, the etching profiles reveal irregular and etching directions are down from the surface of foils. 3. For square wave, there are etching holes with bar shapes along one specific direction. Moreover, because of the characteristics of different currents, the structures of oxide films are discrepant. It infers that: 1. For triangle wave, the rise speed of current is slow that forms oxide films of fine structure. 2. For sine wave, it takes little time to reach max current that produces loose-structure oxide films. 3. For square wave, the current suddenly comes to plus and minus max that electrochemically etches aluminum foils without forming oxide films on the surfaces.
    Appears in Collections:[機械工程研究所] 博碩士論文

    Files in This Item:

    File SizeFormat

    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明