恆電位儀實作與電鍍上之應用; Potentiostat Implementation and Electroplate Application

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Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/2615

Title:	恆電位儀實作與電鍍上之應用;Potentiostat Implementation and Electroplate Application
Authors:	陳哲鋒;Che-Feng Chen
Contributors:	機械工程研究所
Keywords:	電鍍;恆電位儀;恆電流儀;Potentiostat;Galvanostate;electroplate
Date:	2005-07-07
Issue Date:	2009-09-21 11:52:08 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	本論文主要以恆電位儀在電鍍上的應用為目的，而著手實作恆電位儀量測系統的軟硬體，並且經由實際量測開迴路電壓、極限電流及極化電阻等等電鍍特性來驗證恆電位儀實作的可行性。並且經由恆電位儀的掃描電壓-電流曲線中，研究電鍍時所需要設定的參數以及電鍍的結果比較。相同地，電鍍參數設定找尋方式，應用於微電鍍系統時的可行性。使得電鍍及微電鍍所需要設定電鍍電壓值或電鍍電流值時不再是以「嘗試與錯誤的方式」來找尋，以增進對電鍍參數尋找的速度及可靠性。 The propose on this discussion is mainly focuses on Potentiostat Galvanostate on electroplate; and the software that runs the potentiostat Galvanostate system. Furthermore it goes through measuring real time open circuit voltage, limited current, and polarization resistor for the possible success on laboratory testing. It scans and analyzes the voltage - current curve to set the necessary electroplate parameters. In similarity, electroplate parameters is also possible to use on the system of micro-electroplate. In result the electroplate parameters are no longer be found using the trial and error method, and it strengthens the electroplate parameter searching speed and reliability.
Appears in Collections:	[Graduate Institute of Mechanical Engineering] Electronic Thesis & Dissertation

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