English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 41638569      線上人數 : 1739
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/26484


    題名: Schottky enhancement of contacts to n-GaAs via the exchange mechanism using NiAlxGa1-x as a metallization
    作者: Chen,CP;Lin,CF;Swenson,D;Kao,CR;Jan,CH;Chang,YA
    貢獻者: 化學工程與材料工程學系
    關鍵詞: V-COMPOUND SEMICONDUCTORS;MOLECULAR-BEAM EPITAXY;AS TERNARY-SYSTEM;BARRIER HEIGHT;ELECTRICAL-PROPERTIES;PHASE-EQUILIBRIA;DIODES;MODEL;INTERLAYERS;STABILITY
    日期: 1999
    上傳時間: 2010-06-29 17:29:08 (UTC+8)
    出版者: 中央大學
    摘要: Based on the thermodynamic/kinetic model of the exchange mechanism, the ternary intermetallic compound NiAlxGa1-x (where 0 < x less than or equal to 1)was identified as a metallization that may be used to fabricate Schottky enhanced contacts to n-GaAs. Experimental: phase equilibrium:studies of the quaternary Al-Ga-Ni-As system, in conjunction with diffusion data available in the literature, indicated that the phase NiAlxGa1-x fulfills the thermodynamic and kinetic requirements necessary for participation in an exchange reaction with GaAs. Contacts to n-GaAs were fabricated by sputter deposition of NiAlxGa1-x metallizations, with compositions corresponding to x = 0.00, 0.25, 0.50, 0.75 and 1.00. These contacts were subjected to rapid thermal processing, and analyzed using cross-sectional high resolution transmission electron microscopy and I-V characterization. Electron microscopy and concomitant electron dispersive spectroscopic analysis indicated that a very thin (2.5 nm) interfacial region of AlxGa1-xAs was formed in annealed contacts for which x > 0.00, in accordance with the exchange mechanism model. Schottky barrier enhancement was also observed in all annealed contacts for which x > 0.00. The degree of Schottky barrier enhancement was shown to be dependent upon the initial composition of the metallization, again in,accordance with the prediction of the exchange mechanism model. Schottky barrier heights as high:as 0.96 eV were obtained under the optimum annealing conditions of 400 degrees C for 1 min. However, these experimentally determined Schottky barrier heights were somewhat smaller than the values that were anticipated based upon the exchange mechanism model. Potential reasons for these discrepancies were discussed. Overall, it was demonstrated that the thermodynamic/kinetic model of the exchange mechanism is a powerful tool for identifying metallizations that may be used to enhance the Schottky barriers of contacts to n-GaAs. (C) 1999 American Vacuum Society. [S0734-211X(99)04602-8].
    關聯: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    顯示於類別:[化學工程與材料工程研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML486檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明