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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/26911


    題名: Complete analytical solutions of film planarization during spin coating
    作者: Wu,PY;Chou,FC
    貢獻者: 機械工程研究所
    關鍵詞: ROUGH ROTATING-DISK;THIN LIQUID-FILM;TOPOGRAPHY;RESIST;SIMULATION;SUBSTRATE;THICKNESS;MODEL;FLOW
    日期: 1999
    上傳時間: 2010-06-29 18:03:05 (UTC+8)
    出版者: 中央大學
    摘要: To offer a simple set of equations to designers and researchers for describing the degree of planarization (DOP), a first complete analytical solution of film planarization during spin coating is presented. The analytical solutions are suitable for an isolated feature and periodic features in the whole range of Omega(2). The governing dimensionless parameter Omega(2) represents the ratio of centrifugal force to surface tension force during spin coating. For Omega(2) --> 0, surface tension is infinite, and the film is planar. For Omega(2) --> infinity, surface tension is zero, and the film is always conformal, with an equal thickness everywhere. The analytical solutions agree with the existing experiment data and numerical solutions. A comparison shows that the degree of planarization for an isolated trench is higher than that for an isolated ridge in the range of 10(-5) < Omega(2) < 3 x 10(1), but they gradually become identical and independent of d/h(f) for Omega(2) > 3 x 10(1) and Omega(2) < 10(-5). For periodic features, DOPP is independent of dimensionless film thickness, d/h(f), dimensionless line spacing, alpha, and Omega(2) in the range of Omega(2) > 3 x 10(2) and Omega(2) <10(-2) (C) 1999 The Electrochemical Society. S0013-4651(99)01-014-9. All rights reserved.
    關聯: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    顯示於類別:[機械工程研究所] 期刊論文

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