本研究係探討以反應性磁控濺鍍法在玻璃基板上成長氮化鈦鎢薄膜之磨潤行為。重點集中於控制不同濺鍍參數如改變氮氣流量或功率等對鍍膜在機械及磨潤性質上的影響；實驗並以光學顯微鏡及掃描式電子顯微鏡觀察薄膜的微觀組織及磨耗表面的磨損型態。 研究顯示當濺鍍功率為700W，隨著氮氣分壓的增加，薄膜的沉積厚度及硬度均呈現下降趨勢，其中氮氣分壓為5 mbar，氬氣分壓為5 mbar所成長的氮化鈦鎢薄膜具有最高的硬度，達19.33Gpa，且有最佳的抗磨耗特性。此一鍍膜以奈米薄膜測試系統執行刮痕試驗及摩擦係數分析，以刮擦速率10μm/ sec，最大荷重25mN，1500μm刮痕長度為量測條件，其臨界荷重值達 16.32 mN時，摩擦係數表現最低，約在0.06~0.08之間。 經S.R.V. 試驗機磨潤試驗後之薄膜磨痕顯微觀察顯示，造成氮化鈦鎢薄膜破損的主要磨耗機制包含犁耕、黏著與局部脫落；硬度是此類薄膜抗磨耗的主要因素，亦即薄膜硬度愈硬，抗磨耗性也愈佳。 This study was focus on the tribological behavior of the titanium tungsten nitride (Ti-W-N) thin films that were deposited on the glass substrates by reactive magnetron sputtering method. The effects investigated in mechanical properties and tribological characteristics of Ti-W-N thin films were correlated to the manufacturing parameters such as partial pressure of nitrogen and sputtering power. Meanwhile, the microstructures and worn surface for coatings were examined by optical microscopy and scanning electron microscopy. The results reveal that the hardness and thickness of thin films were decreased while N2 Partial pressure increased under 700W RF power processingcondition. Especially, the Ti-W-N film depositedunder N2 partial pressure of 5 mbar is exhibitsthe best wear resistant and best hardness of 19.33GPa. Besides, as the critical load up to 16.32 mN that would be lead to obtained lowest friction coefficient 0.06~0.08 in this film in which was tested by scratch with Nano Indenter system. From the observation of worn surfaces that for these Ti-W-N films after tribological tested by S.R.V. machine that showed the main wear mechanism of films include as Plowing, adhesion and partially flaked. Hardness plays an Important role in anti-wear mechanism of these films that With higher hardness would be exhibited higher wear resistance.