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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/2710


    題名: 運用化學機械拋光法於玻璃基板表面拋光之研究;A study on glass surface polishing by using the chemical mechanical polishing method
    作者: 陳美惠;Hui-Mei Chen
    貢獻者: 機械工程研究所碩士在職專班
    關鍵詞: 氧化鈰;研磨輪;拋光;玻璃基板;表面粗糙度;拋光墊;不織布;不繡鋼;stainless steel;Non-woven fabric;polishing pad;optical glass;polishing;grind wheel;CeO2;roughness of surface
    日期: 2008-06-20
    上傳時間: 2009-09-21 11:53:56 (UTC+8)
    出版者: 國立中央大學圖書館
    摘要: 光學玻璃有別於一般玻璃,須要具備良好的物理與化學特性,由於光學玻璃在生產或製造過程中,難免會有外觀規格上的瑕疵,實際應用上不是以區分等級來適用就是以廢棄物回收處理,若嘗試以添加自由磨粒輔助機械微研拋加工,使高硬度、低軔性又難加工的光學玻璃亦能獲得極少量移除效果並兼具光滑平整的工件表面,以達到所需的幾何外形要求。 對於光學玻璃而言,微研磨拋光加工參數對於加工件品質及加工效率的影響頗大,故如何訂定加工參數的最適化是相當大的難題,因此本研究是利用具有CNC加工功能的微雕刻機為加工設備,並將雕刻機的加工雕刻針頭置換成自製的研磨棒,於研磨棒底端加上拋光墊或不織布材料,以厚度0.7mm的康寧光學玻璃為被加工工件,置於氧化鈰 (CeO2) 研磨拋光液中,分別以研磨棒轉速、施加荷重、加工時間、拋光墊材料等參數進行加工,並針對每一種參數的趨勢與結果作分析與討論。 由實驗結果得知,使用粒徑為0.85~1.66μm (8000號)的CeO2及TZ-9000與PQH5拋光墊,對光學玻璃試片進行機械旋轉拋光時,於適當的荷重下研磨15min後即可將光學玻璃原始表面粗糙度值為Ra 0.3 μm(Rmax 3.7 μm)的損傷面,下降至Ra 0.03 μm左右 (Rmax 0.25μm左右)的鏡面水準。如以不織布進行研磨,於適當的荷重下,研磨15min後即可將光學玻璃改善Ra 0.04 μm左右 (Rmax 0.3μm左右)。 The difference between optical glass and generally glass, Optical glass need fine nature and chemical property, Due to optical glass in the process of manufacture, Can be to make a lot flaw in surface, So Application to use as differentiate between the rank or worked it to recycle, As if try use freedom polish to assist mechanical polishing working, To proffer high hardness、low ductility and difficult to work the surface get a little remove and smooth effect on optical glass, To get up to need geometry shape. About optical glass, abstruse grind polishing parameter effect work quality and efficiency, An arduous problem what was look for definition work parameter best, So the research use CNC tiny sculpture mechanical for work equipment, needle of sculpture mechanical change stainless steel abrasive stick Completely, It increase the polish pad or non-woven fabric on the bottom of the polish stick, Workpicec use 0.7mm Corning optical glass, The optical glass into the polish water of the CeO2 , The control parameters of the polishinf process include the polishing time, the axial loading, work time, polishing material, Moreover, the experimental parameters results were also analyzed and discussed . The experimental parameters results, CeO2 particles of size 0.85–1.66μm (#8000) were used in this study, optical glass After turning machined surface polishing, Base on the different parameters experimental results, TZ-9000N and PQH5 polishing pad, On the suitable time, 15 min after the initial roughness of surface could be improved from 0.3 μm Ra (3.7 μm Rmax )to 0.03 μm Ra(0.25 μm Rmax ). The use Non-woven fabric polishing pad after polishing, On the suitable time, 15 min after the initial roughness of surface could be improved from 0.3 μm Ra (3.7 μm Rmax )to 0.04 μm Ra(0.3 μm Rmax ).
    顯示於類別:[機械工程學系碩士在職專班 ] 博碩士論文

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