English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 41627708      線上人數 : 2414
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/27286


    題名: Gas-phase removal of H2S and NH3 with dielectric barrier discharges
    作者: Chang,MB;Tseng,TD
    貢獻者: 環境工程研究所
    關鍵詞: COMBINED PLASMA PHOTOLYSIS;CONTROL TECHNOLOGY;OXYGEN;SO2;AIR;STREAMS
    日期: 1996
    上傳時間: 2010-06-29 18:22:02 (UTC+8)
    出版者: 中央大學
    摘要: Hydrogen sulfide and ammonia are two inorganic compounds that may cause severe odor problems. In this study, the effectiveness of applying dielectric barrier discharges (DBDs) to destroy and remove these two odor-causing compounds from gas streams via the generation of gas-phase radicals and high-energy electrons is experimentally evaluated with a bench-scale apparatus. Experimental results indicate that the removal efficiencies of both H2S and NH3 With DBD plasmas depend on the gas composition, gas residence time, and applied voltage. Electronegative gases, such as O-2 and H2O(g), tend to increase the electron attachment and therefore decrease removal efficiencies. Simultaneous removal of H2S and NH3 from gas streams is accomplished with DBD technology. Results of this study indicate DBD is an effective technology for controlling inorganic odor-causing compounds.
    關聯: JOURNAL OF ENVIRONMENTAL ENGINEERING-ASCE
    顯示於類別:[環境工程研究所 ] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML380檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明