English  |  正體中文  |  简体中文  |  Items with full text/Total items : 72271/72271 (100%)
Visitors : 23077067      Online Users : 642
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/2769

    Title: 四道光干涉微影之曝光與顯影參數對 微結構輪廓及深度之探討;The influences of exposure and development parameters on the shape and depth of micro-structure for four-beam interferometric lithography
    Authors: 黃家麒;Cha-Chi Huang
    Contributors: 機械工程研究所
    Keywords: 雷射干涉微影;四道光曝光;four-beam exposure;laser interference lithography
    Date: 2006-07-05
    Issue Date: 2009-09-21 11:55:21 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 摘要 雷射干涉微影(Laser Interference Lithography)只須簡單的光學鏡組及雷射光源,且不須通過光罩,便可由此系統得到一維條紋及二維點陣或洞陣的週期性結構。此系統的優點在於擁有極大的聚焦深度、易於大面積曝光、低成本、高解析度。 四道光單曝光除了有干涉微影的優點外,更有著高產能、高對比度、以及易形成深孔等優勢。因此,本研究將建立四道光單曝光強度分佈之數學模型並進行相關實驗,由實驗結果分析得知,在相同曝光與顯影參數下,四道光單曝光將會使光強重新分配,使得其所得到的微結構比兩道光雙曝光之結構更為尖銳(sharper)。 另外,隨著曝光時間與顯影時間的增加,結構的特徵尺寸將會縮小,高度上亦將有所變化。本研究在適當的曝光與顯影參數下,利用ICP乾蝕刻成功地在矽基板上得到四道光單曝光所建構出的二維週期性陣列結構。 Abstract In this research, we have developed laser interference lithography system, such as one dimension linear gratings or two dimension arrays of dots and grids, to create periodical structures. The method of maskless laser interference lithography used for generation of infinite depth of focus, relative simplicity, low cost, deep sub-micron patterns and high resolution in large field of view is investigated. The main advantage of four-beam exposure is that higher throughput process for patterning arrays and higher contrast images can be obtained. According to theoretical analysis and experimental results, four-beam exposure allows a greater percentage of the incident energy to be redistributed near the intensity maxima and generates structures sharper. The effects of the process parameters on the shape and depth of the structure have been discussed. According to different critical dimension, this thesis also suggests several parameters for exposure and development, with which best pattern had been acquired in our experiments.
    Appears in Collections:[機械工程研究所] 博碩士論文

    Files in This Item:

    File SizeFormat

    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明