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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/27738


    題名: Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
    作者: Tang,CJ;Jaing,CC;Wu,K;Lee,CC
    貢獻者: 薄膜技術中心
    關鍵詞: COMPOSITE THIN-FILMS;OXIDE-FILMS;INTRINSIC STRESS;INTERNAL-STRESS;COEVAPORATION;GROWTH
    日期: 2009
    上傳時間: 2010-06-29 19:16:03 (UTC+8)
    出版者: 中央大學
    摘要: In this study, Ta2O5-SiO2 Composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced. (C) 2008 Elsevier B.V. All rights reserved.
    關聯: THIN SOLID FILMS
    顯示於類別:[薄膜技術研究中心] 期刊論文

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