Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering

NCU Institutional Repository > 研究中心 > 薄膜技術研究中心 > 期刊論文 > Item 987654321/27738

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/27738

题名:	Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
作者:	Tang,CJ;Jaing,CC;Wu,K;Lee,CC
贡献者:	薄膜技術中心
关键词:	COMPOSITE THIN-FILMS;OXIDE-FILMS;INTRINSIC STRESS;INTERNAL-STRESS;COEVAPORATION;GROWTH
日期:	2009
上传时间:	2010-06-29 19:16:03 (UTC+8)
出版者:	中央大學
摘要:	In this study, Ta2O5-SiO2 Composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced. (C) 2008 Elsevier B.V. All rights reserved.
關聯:	THIN SOLID FILMS
显示于类别:	[薄膜技術研究中心] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	1354	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing