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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/28073


    Title: Effects of thermal annealing on titanium oxide films prepared by ion-assisted deposition
    Authors: Jaing,CC;Chen,HC;Lee,CC
    Contributors: 光電科學研究所
    Keywords: THIN-FILMS;OPTICAL-PROPERTIES;RESIDUAL-STRESS
    Date: 2009
    Issue Date: 2010-06-29 19:41:17 (UTC+8)
    Publisher: 中央大學
    Abstract: Titanium oxide thin films are prepared at a substrate temperature of 250 A degrees C by electron-beam evaporation and ionassisted deposition. The effects of thermal annealing temperatures from 100 to 450 A degrees C on the optical and mechanical properties are studied. The optical and mechanical properties include refractive indices, extinction coefficients, residual stress, surface roughness and crystallization. Experimental results show these properties of titanium oxide films clearly depend on the thermal annealing process.
    Relation: OPTICAL REVIEW
    Appears in Collections:[光電科學研究所] 期刊論文

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