Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O-2 gas

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/28123

Title:	Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O-2 gas
Authors:	Liao,BH;Lee,CC;Jaing,CC;Liu,MC
Contributors:	光電科學研究所
Keywords:	BEAM-ASSISTED DEPOSITION;THIN-FILMS;ULTRAVIOLET;COATINGS;MGF2;CONSTANTS;PLASMAS;LAF3;SIO2
Date:	2009
Issue Date:	2010-06-29 19:42:05 (UTC+8)
Publisher:	中央大學
Abstract:	In this study, AlF3 thin films were deposited by pulse magnetron sputtering of Al targets with different ratios of CF4/O-2 gas and at different sputtering powers. The optical and mechanical properties of the AlF3 thin films were analyzed. The transmittance spectra showed no obvious negative inhomogeneous refractive indices. Denser films with a low optical absorption were obtained when high sputtering powers were used (larger than 30 W). The lowest extinction coefficient (7.3 x 10(-4) at 193 nm) of the films can be reached with 12 sccm O-2 flow rate and at 160W sputtering power. All of the residual stresses were compressive and their trends were consistent with the refractive indices. The lowest compressive stress (0.068 GPa) was obtained when the AlF3 films were prepared at 160W sputtering power.
Relation:	OPTICAL REVIEW
Appears in Collections:	[Graduate Institute of Optics and Photonics] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	509	View/Open

社群 sharing