Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

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题名:	Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell
作者:	Chao,CC;Wang,CM;Chang,YC;Chang,JY
贡献者:	光電科學研究所
关键词:	COUPLED-WAVE ANALYSIS;SOLAR-CELLS;DIFFRACTION;FORMULATION;GRATINGS
日期:	2009
上传时间:	2010-06-29 19:42:18 (UTC+8)
出版者:	中央大學
摘要:	A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (alpha-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the alpha-Si layer. Compared with the indium tin oxide (ITO)/alpha-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.
關聯:	OPTICAL REVIEW
显示于类别:	[光電科學研究所] 期刊論文

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