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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/28146

    Title: Reduction of polarization and swing effects in a high numerical aperture exposure system by utilizing resist antireflective coatings
    Authors: Chen,HL;Lee,WH;Fan,W;Chuang,SY;Lai,YH;Lee,CC
    Contributors: 光電科學研究所
    Keywords: HIGH NA
    Date: 2009
    Issue Date: 2010-06-29 19:42:28 (UTC+8)
    Publisher: 中央大學
    Abstract: Exposure systems having high numerical apertures (NAs) are essential for increasing the resolution of optical lithography. The efficiency of conventional single-layer bottom antireflective coating (BARC) structures, however, degrades as the angle of incidence increases. In this paper we demonstrate a multilayer BARC structure for high-NA systems employed in ArF lithography. Because the reflection difference between transverse electric (TE or s) and transverse magnetic (TM or p) polarization at the air-resist interface results in low image contrast for high-NA exposure systems, we also describe a single-layer top antireflective coating (TARC) layer that can be used to reduce the polarization effect. By combining the optimized TARC and multilayer BARC structures, the swing effect can be alleviated and the image contrast can be improved for angles of incidence ranging from 00 to 700 (i.e., NA = ca. 0.93). (C) 2008 Elsevier B.V. All rights reserved.
    Appears in Collections:[光電科學研究所] 期刊論文

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