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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/28228


    Title: FUZZY ANALYSIS OF THE LINEAR EQUIVALENT FOR FABRICATING A HOLOGRAPHIC OPTICAL-ELEMENT IN PHOTORESIST
    Authors: CHANG,RS;LIN,CS;HU,CP
    Contributors: 光電科學研究所
    Keywords: SURFACE-RELIEF GRATINGS;DEEP
    Date: 1995
    Issue Date: 2010-06-29 19:44:27 (UTC+8)
    Publisher: 中央大學
    Abstract: In this paper fuzzy analysis for economically fabricating a holographic optical element (HOE) in photoresist is conducted. We find that the grating profile has a close relationship with diffraction efficiency, and that the process parameters influence the grating profile significantly. Thus, using the fuzzy control in these relations, it becomes possible to predict the diffraction efficiency and to solve many problems in the grating fabrication process. From the modulation mechanism in these complex holograms we believe we have extracted the necessary and intrinsic qualities, and our model of fuzzy set analysis produces good general agreement with the experimentally measured diffraction efficiency. The new concepts of the ''linear equivalent'' which we established to simplify a HOE from a honeycomb structure to a linear one will be helpful for processing various types of HOEs.
    Relation: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    Appears in Collections:[光電科學研究所] 期刊論文

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