English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 41638037      線上人數 : 1763
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/28228


    題名: FUZZY ANALYSIS OF THE LINEAR EQUIVALENT FOR FABRICATING A HOLOGRAPHIC OPTICAL-ELEMENT IN PHOTORESIST
    作者: CHANG,RS;LIN,CS;HU,CP
    貢獻者: 光電科學研究所
    關鍵詞: SURFACE-RELIEF GRATINGS;DEEP
    日期: 1995
    上傳時間: 2010-06-29 19:44:27 (UTC+8)
    出版者: 中央大學
    摘要: In this paper fuzzy analysis for economically fabricating a holographic optical element (HOE) in photoresist is conducted. We find that the grating profile has a close relationship with diffraction efficiency, and that the process parameters influence the grating profile significantly. Thus, using the fuzzy control in these relations, it becomes possible to predict the diffraction efficiency and to solve many problems in the grating fabrication process. From the modulation mechanism in these complex holograms we believe we have extracted the necessary and intrinsic qualities, and our model of fuzzy set analysis produces good general agreement with the experimentally measured diffraction efficiency. The new concepts of the ''linear equivalent'' which we established to simplify a HOE from a honeycomb structure to a linear one will be helpful for processing various types of HOEs.
    關聯: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    顯示於類別:[光電科學研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML484檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明