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    題名: Photochemical Activities of N-Nitroso Carboxamides and Sulfoximides and Their Application to DNA Cleavage
    作者: Hwu,JR;Huang,JJT;Tsai,FY;Tsay,SC;Hsu,MH;Hwang,KC;Horng,JC;Ho,JAA;Lin,CC
    貢獻者: 中央大學
    關鍵詞: NITRIC-OXIDE;NOBEL LECTURE;ELECTRON-TRANSFER;RELAXING FACTOR;DAMAGE;MECHANISM;DISCOVERY;ADDUCTS;ANALOGS;BINDING
    日期: 2009
    上傳時間: 2010-06-29 19:46:14 (UTC+8)
    出版者: 化學研究所
    摘要: N-Nitroso compounds containing benzene, fluorene or fluorenone rings were synthesized. Photolysis of these compounds with 312-nm UV light provided the NO center dot species, the presence of which was corroborated by use of an EPR method and of 2-phenyl-4.4,5.5-tetramethylimidazolin-1-oxyl 3-oxide (PTIO) as a trapping agent. During irradiation of N-methyl-N-nitroso-9-fluorenone carboxamide (14c) in the absence of PTIO, it underwent decomposition followed by re-combination to give the heterocyclic nitric oxide radical 15. Incorporation of intercalating moieties endowed the N-nitroso compounds with DNA-cleaving ability through single-strand scission upon UV irradiation in a phosphate buffer (pH 5.0-8.0) under aerobic conditions.
    關聯: CHEMISTRY-A EUROPEAN JOURNAL
    顯示於類別:[化學研究所] 期刊論文

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