English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 42791860      線上人數 : 1157
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/28410


    題名: Hydrogen chemisorption and thermal desorption on the diamond C(111) surface
    作者: Su,C;Song,KJ;Wang,YL;Lu,HL;Chuang,TJ;Lin,JC
    貢獻者: 中央大學
    關鍵詞: CHEMICAL-VAPOR-DEPOSITION;AB-INITIO CALCULATIONS;ATOMIC-HYDROGEN;INFRARED-SPECTROSCOPY;MONOHYDRIDE PHASE;100 SURFACES;ISOTHERMAL DESORPTION;NANOCRYSTAL SURFACES;VIBRATIONAL-SPECTRA;(100)2X1 SURFACE
    日期: 1997
    上傳時間: 2010-06-29 19:48:18 (UTC+8)
    出版者: 化學研究所
    摘要: Temperature programmed desorption (TPD) and low energy electron diffraction (LEED) were utilized to study the interaction of atomic hydrogen with single crystal diamond C(111) surface. From isotherm and isostere analysis of TPD spectra acquired at various sample heating rates ranging from 0.6 K/s to 30 K/s, the kinetic parameters were extracted. It is found that molecular hydrogen desorption from the C(111) surface exhibits the first-order kinetics, This result is confirmed by no apparent shift in peak temperatures of TPD spectra for hydrogen coverage above 0.2 ML. At lower coverage regime, the isothermal desorption experiment also indicates the first-order desorption kinetics. A nearly coverage-independent activation energy of (3.7 +/- 0.1) eV and a prefactor of (9.5 +/- 4.0)x10(13) s(-1) are obtained except at relatively low coverages (below similar to 0.2 ML). In addition, the half-order LEED spots intensity decreases linearly with increase of the hydrogen coverage and drops to zero at similar to 0.5 ML. These results are interpreted with a model that during adsorption hydrogen atoms segregate to form metastable, highly hydrogenated domains from where hydrogen atoms recombine and desorb concertedly as the substrate surface is heated up. The comparison of this work with the hydrogen adsorption and desorption on silicon surfaces is also discussed, (C) 1997 American Institute of Physics.
    關聯: JOURNAL OF CHEMICAL PHYSICS
    顯示於類別:[化學研究所] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML720檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明