Fabrication of 2D ordered arrays of cobalt silicide nanodots on (001)Si substrates

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Title:	Fabrication of 2D ordered arrays of cobalt silicide nanodots on (001)Si substrates
Authors:	Cheng,S. L.;Lu,S. W.;Wong,S. L.;Chang,C. C.;Chen,H.
Contributors:	材料科學與工程研究所
Keywords:	NANOSPHERE LITHOGRAPHY;INTERFERENCE LITHOGRAPHY;EPITAXIAL-GROWTH;OXIDE OPENINGS;COSI2;NISI2;FILMS;TISI2
Date:	2007
Issue Date:	2010-07-06 15:58:32 (UTC+8)
Publisher:	中央大學
Abstract:	Two-dimensional (2D) periodic arrays of Co metal and Co silicide nanodots were successfully fabricated on (0 0 I)Si substrate by using the polystyrene (PS) nanosphere lithography (NSL) technique and thermal annealing. The epitaxial CoSi2 was found to star
Relation:	JOURNAL OF CRYSTAL GROWTH
Appears in Collections:	[Institute of Materials Science and Engineering] journal & Dissertation

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