Oxidative conversion of PFC via plasma processing with dielectric barrier discharges

NCUIR > Engineering College > Graduate Institute of Environmental Engineering > journal & Dissertation > Item 987654321/30199

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30199

Title:	Oxidative conversion of PFC via plasma processing with dielectric barrier discharges
Authors:	Yu,SJ;Chang,MB
Contributors:	環境工程研究所
Keywords:	ABATEMENT;EMISSIONS;CF4
Date:	2001
Issue Date:	2010-07-06 16:14:30 (UTC+8)
Publisher:	中央大學
Abstract:	Perfluorocompounds (PFCs) have been extensively used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. PFCs have significant effects on the global warming and have very long atmospheric lifetimes. Labor
Relation:	PLASMA CHEMISTRY AND PLASMA PROCESSING
Appears in Collections:	[Graduate Institute of Environmental Engineering ] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	510	View/Open

社群 sharing