Effect of ethanol on the photoelectrochemical fabrication of macroporous N-Si(100) in HF solution

NCUIR > Engineering College > Graduate Institute of Mechanical Engineering > journal & Dissertation > Item 987654321/30278

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30278

Title:	Effect of ethanol on the photoelectrochemical fabrication of macroporous N-Si(100) in HF solution
Authors:	Lin,Jing-Chie;Lai,Chien-Ming;Jehng,Wern-Dare;Hsueh,Kan-Lin;Lee,Sheng-Long
Contributors:	機械工程研究所
Keywords:	N-TYPE SILICON;POROUS SILICON;FORMATION MECHANISM;DISSOLUTION;ARRAY
Date:	2008
Issue Date:	2010-07-06 16:15:55 (UTC+8)
Publisher:	中央大學
Abstract:	The effect of ethanol on the photoelectrochemical fabrication of macroporous n-type Si(100) (pore diameter > 50 nm) in 2.0 M hydrofluoric acid was investigated. A cross-sectional scanning electron microscope examination revealed the formation of rough big
Relation:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Appears in Collections:	[Graduate Institute of Mechanical Engineering] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	398	View/Open

社群 sharing