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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/30596


    Title: Effects of plasma power and plasma sheath on field emission properties of carbon nanotubes
    Authors: Ting,JH;Su,CY;Huang,FY;Hsu,CL;Samukawa,S
    Contributors: 機械工程研究所
    Keywords: CHEMICAL-VAPOR-DEPOSITION;GROWTH;EMITTERS;FILMS
    Date: 2006
    Issue Date: 2010-07-06 16:23:00 (UTC+8)
    Publisher: 中央大學
    Abstract: With a nickel catalyst, carbon nanotubes (CNTs) were prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD). Transmission electron microscopy (TEM) images reveal the center hollowness and multiwall structure of CNTs. The tip-growth mechan
    Relation: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
    Appears in Collections:[機械工程研究所] 期刊論文

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