Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography

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Title:	Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography
Authors:	Chen,JK;Ko,FH;Hsieh,KF;Chou,CT;Chang,FC
Contributors:	化學工程與材料工程研究所
Keywords:	SELF-ASSEMBLED MONOLAYERS;ALKYLSILOXANE MONOLAYERS;IMPRINT LITHOGRAPHY;CONTACT ANGLES;SILICON;DEPOSITION;ALKYLTRICHLOROSILANES;TEMPERATURE;POLYMERS;COATINGS
Date:	2004
Issue Date:	2010-07-06 16:23:09 (UTC+8)
Publisher:	中央大學
Abstract:	We have applied trichloro(3,3,3-trifluoropropyl)silane (FPTS) and trichloro(1H, 1H, 2H, 2H-perfluorooctyl)silane (FOTS) for the preparation of self-assembled film on a silicon mold for use as releasing, antisticking layers for nanoimprint lithography. Fro
Relation:	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Appears in Collections:	[National Central University Department of Chemical & Materials Engineering] journal & Dissertation

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