Effect of air shear on film planarization during spin coating

NCUIR > Engineering College > Graduate Institute of Mechanical Engineering > journal & Dissertation > Item 987654321/31159

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Title:	Effect of air shear on film planarization during spin coating
Authors:	Chou,FC;Wu,PY
Contributors:	機械工程研究所
Keywords:	ROTATING-DISK;THIN-FILMS;TOPOGRAPHY;FLOW
Date:	2000
Issue Date:	2010-07-06 16:37:50 (UTC+8)
Publisher:	中央大學
Abstract:	In some spin-coating processes such as antireflective coating and E-beam resist for nanometer patterning, the effect of air shear on film planarization becomes significant. Here analytical solutions of film profiles and the degree of planarization over is
Relation:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Appears in Collections:	[Graduate Institute of Mechanical Engineering] journal & Dissertation

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