Electrodeposition of copper at well-defined Pt(111) and Rh(111) electrodes in sulfuric acid solutions: Studying with in situ scanning tunneling microscopy

NCU Institutional Repository > 理學院 > 化學研究所 > 期刊論文 > Item 987654321/34841

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/34841

题名:	Electrodeposition of copper at well-defined Pt(111) and Rh(111) electrodes in sulfuric acid solutions: Studying with in situ scanning tunneling microscopy
作者:	Wu,ZL;Zang,ZH;Yau,SL
贡献者:	化學研究所
关键词:	IN-SITU;UNDERPOTENTIAL DEPOSITION;SUBMONOLAYER AMOUNTS;INDUCED ADSORPTION;AU(111);SULFATE;STM;PLATINUM(111);COADSORPTION;ANIONS
日期:	2000
上传时间:	2010-07-07 12:14:04 (UTC+8)
出版者:	中央大學
摘要:	We report in situ scanning tunneling microscopy (STM) results of underpotential deposition (UPD) of copper at well-ordered Pt(lll) and Rh(lll) electrodes in sulfuric acid solutions. Cyclic voltammograms of Pt(lll) at 1 mV/s in 0.05 M H2SO4 and 5 mM CuSO4
關聯:	LANGMUIR
显示于类别:	[化學研究所] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	425	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing