Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system

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题名:	Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system
作者:	Chien,Cheng-Wei;Lee,Yun-Chih;Lee,Po-Shen;Chang,Jenq-Yang;Chen,Jyh-Chen
贡献者:	光電科學與工程學系
关键词:	INTERFERENCE LITHOGRAPHY;CRYSTALS;GAP;PHOTORESIST;WAVELENGTHS;SCATTERERS;SYMMETRIES;EXPOSURES;GRATINGS;DEFECTS
日期:	2007
上传时间:	2010-07-07 14:07:36 (UTC+8)
出版者:	中央大學
摘要:	An interferometric lithographic technique and double exposure method are applied to theoretically and experimentally investigate several kinds of 2D periodic structures. The shape, lattice symmetries, and lattice constants of the 2D structures, for differ
關聯:	APPLIED OPTICS
显示于类别:	[光電科學與工程學系] 期刊論文

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