Effect of thermal annealing on the optical properties and residual stress of TiO2 films produced by ion-assisted deposition

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35349

Title:	Effect of thermal annealing on the optical properties and residual stress of TiO2 films produced by ion-assisted deposition
Authors:	Lee,CC;Chen,HC;Jaing,CC
Contributors:	光電科學與工程學系
Keywords:	TITANIUM-OXIDE FILMS;THIN-FILMS;MICROSTRUCTURE;TEMPERATURE;EVAPORATION
Date:	2005
Issue Date:	2010-07-07 14:11:24 (UTC+8)
Publisher:	中央大學
Abstract:	The effects of thermal annealing of titanium oxide films deposited by ion-beam assistance at annealing temperatures from 100 degrees C to 300 degrees C on the residual stress and optical properties of the films was investigated. The refractive indices and
Relation:	APPLIED OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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