English  |  正體中文  |  简体中文  |  Items with full text/Total items : 66984/66984 (100%)
Visitors : 23057684      Online Users : 405
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35418


    Title: Effects of ion energy on internal stress and optical properties of ion-beam sputtering Ta2O5 films
    Authors: Tien,CL;Lee,CC
    Contributors: 光電科學與工程學系
    Keywords: PHASE-SHIFTING INTERFEROMETRY;THIN-FILMS;ASSISTED DEPOSITION;REFRACTIVE-INDEX;COATINGS
    Date: 2003
    Issue Date: 2010-07-07 14:14:07 (UTC+8)
    Publisher: 中央大學
    Abstract: The effects of ion-beam energy on the internal stress and optical properties of tantalum pentoxide (Ta2O5) thin film have been investigated. Ta2O5 thin films were deposited on unheated glass substrates by ion-beam sputter deposition (IBSD) with different
    Relation: JOURNAL OF MODERN OPTICS
    Appears in Collections:[光電科學與工程學系] 期刊論文

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML323View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明