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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35489

    Title: An apparatus for the measurement of internal stress and thermal expansion coefficient of metal oxide films
    Authors: Lee,CC;Tien,CL;Sheu,WS;Jaing,CC
    Contributors: 光電科學與工程學系
    Keywords: SI;TEMPERATURE
    Date: 2001
    Issue Date: 2010-07-07 14:29:12 (UTC+8)
    Publisher: 中央大學
    Abstract: A measuring apparatus based on a phase shifting interferometry technique to determine the mechanical properties of metal oxide films was presented. Thin films were prepared by ion-beam sputter deposition at low substrate temperature. Quantitative determin
    Appears in Collections:[光電科學與工程學系] 期刊論文

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