Determination of the mechanical properties of thin films by digital phase shifting interferometry

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35493

Title:	Determination of the mechanical properties of thin films by digital phase shifting interferometry
Authors:	Tien,CL;Lee,CC;Tsai,YL;Sun,WS
Contributors:	光電科學與工程學系
Keywords:	THERMAL-EXPANSION COEFFICIENT;ION-ASSISTED DEPOSITION;STRESS;SILICON
Date:	2001
Issue Date:	2010-07-07 14:30:45 (UTC+8)
Publisher:	中央大學
Abstract:	A new method for the measurement of internal stress and coefficient of thermal expansion of thin oxide films is presented and investigated experimentally, that combines digital phase shifting interferometry with image-processing technique to improve the a
Relation:	OPTICS COMMUNICATIONS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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