Long-term thermal stability of Ti/Al/Pt/Au Ohmic contacts to n-type GaN

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35543

Title:	Long-term thermal stability of Ti/Al/Pt/Au Ohmic contacts to n-type GaN
Authors:	Lee,CT;Kao,HW
Contributors:	光電科學與工程學系
Keywords:	LAYER;FILMS;TI/AL
Date:	2000
Issue Date:	2010-07-07 14:35:33 (UTC+8)
Publisher:	中央大學
Abstract:	We present a study of the long-term thermal stability and low specific contact resistance of Ti/Al/Pt/Au multilayer contacts to n-type GaN. The Ohmic performance can be maintained up to 60 and 540 min for thermal annealing at 950 and 850 degrees C, respec
Relation:	APPLIED PHYSICS LETTERS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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