Simultaneous determination of the thermal expansion coefficient and the elastic modulus of Ta2O5 thin film using phase shifting interferometry

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35558

Title:	Simultaneous determination of the thermal expansion coefficient and the elastic modulus of Ta2O5 thin film using phase shifting interferometry
Authors:	Tien,CL;Jaing,CC;Lee,CC;Chuang,KP
Contributors:	光電科學與工程學系
Keywords:	ION-ASSISTED DEPOSITION;REFRACTIVE-INDEX;DIELECTRIC FILMS;RESIDUAL-STRESS;YOUNGS MODULUS;NITRIDE FILMS;TEMPERATURE;SILICON;COATINGS;SIO2
Date:	2000
Issue Date:	2010-07-07 14:36:04 (UTC+8)
Publisher:	中央大學
Abstract:	This paper reports on the application of a phase shifting interferometry technique for the concurrent measurement of the thermal expansion coefficient alpha(f) and the elastic modulus E-f/1 nu(f) of Ta2O5 thin film. The Ta2O5 films were prepared by ion be
Relation:	JOURNAL OF MODERN OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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